Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | MRGPRX4 | Q96LA9 | 1/20 | 0.40 |
| ▸ | ELANE | P08246 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 4/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4884127 | 0.85 | TSHR (0.47) | MAPTCYP1A2CYP2C9KMT2AMEN1 | |
| SCHEMBL15495945 | 0.84 | TRPA1 (0.42) | MAPTNPSR1KMT2ASMN1; SMN2ELANE | |
| SCHEMBL15388438 | 0.84 | HSD17B1 (0.40) | CYP3A4KMT2ASMN1; SMN2HPGDELANE | |
| SCHEMBL7044116 | 0.84 | ELANE (0.50) | L3MBTL1MAPTKMT2ASMN1; SMN2ELANE | |
| SCHEMBL7934361 | 0.83 | L3MBTL1 (0.49) | L3MBTL1MAPTCYP1A2CYP3A4CYP2C9 | |
| SCHEMBL9915689 | 0.82 | L3MBTL1 (0.35) | L3MBTL1MAPTCYP1A2CYP3A4CYP2C9 | |
| SCHEMBL11561400 | 0.82 | GAA (0.46) | L3MBTL1MAPTCYP3A4KMT2AMEN1 | |
| SCHEMBL1799618 | 0.82 | LMNA (0.52) | L3MBTL1MAPTCYP1A2CYP3A4CYP2C9 | |
| SCHEMBL19903990 | 0.82 | PDE10A (0.41) | L3MBTL1MAPTCYP1A2CYP3A4CYP2C9 | |
| SCHEMBL18468417 | 0.82 | MRGPRX4 (0.43) | MAPTNPSR1KMT2ASMN1; SMN2MRGPRX4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8648160-B2 | Optical semiconductor sealing material | IDEMITSU KOSAN CO., LTD. (JP) | 2014-02-11 | — | — | US | claimed |
| JP-59082343-A | — | — | None | — | — | JP | disclosed |
| US-12473388-B2 | Acrylic polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 2025-11-18 | — | — | US | disclosed |
| EP-3587491-B1 | RESIN COMPOSITION CONTAINING POLYMER PARTICLES | KURARAY CO (JP) | 2024-01-31 | — | — | EP | disclosed |
| EP-3878876-B1 | ACRYLIC POLYMER | NIPPON CATALYTIC CHEM IND (JP) | 2024-01-10 | — | — | EP | disclosed |
| US-20220002457-A1 | Acrylic Polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 2022-01-06 | — | — | US | disclosed |
| CN-113508146-A | Acrylic acid series polymer | 株式会社日本触媒 | 2021-10-15 | — | — | CN | disclosed |
| EP-3878876-A1 | ACRYLIC POLYMER | Nippon Shokubai Co., Ltd. (JP) | 2021-09-15 | — | — | EP | disclosed |
| CN-107849201-B | Block copolymer | 株式会社日本触媒 | 2021-05-14 | — | — | CN | disclosed |
| US-9764293-B2 | Gas separation composite membrane, method of producing the same, gas separating module using the same, and gas separation apparatus and gas separation method | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| EP-1225478-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-24 | — | — | EP | disclosed |
| US-6423467-B1 | USEFUL IN A LITHOGRAPHIC PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-23 | — | — | US | disclosed |
| US-20020086233-A1 | Useful in a lithographic printing plates | FUJIFILM CORPORATION (JP) | 2002-07-04 | — | — | US | disclosed |
| US-20020051929-A1 | Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life | FUJIFILM CORPORATION (JP) | 2002-05-02 | — | — | US | disclosed |
| US-6132931-A | A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-6110640-A | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0949539-A2 | Photosensitive resin composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0843218-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| US-4636458-A | LOW WATER ABSORPTION | ROHM GMBH (DE) | 1987-01-13 | — | — | US | disclosed |
| JP-S5982343-A | PREPARATION OF XYLYL ACRYLATE OR XYLYL METHACRYLATE | NIPPON SHOKUBAI KAGAKU KOGYO CO LTD | 1984-05-12 | — | — | JP | disclosed |