SCHEMBL4596410

SCHEMBL4596410

C=CC(=O)Oc1ccccc1CC(C)C

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 4/20 0.59
THRA P10827 1/20 0.59
GABRA1 P14867 1/20 0.41
GABRB2 P47870 1/20 0.41
TSHR P16473 1/20 0.40
HTT P42858 2/20 0.38
HPGD P15428 2/20 0.38
CTSS P25774 1/20 0.36
CTSK P43235 1/20 0.36
KDM4E B2RXH2 1/20 0.36
MAPT P10636 1/20 0.36
HSD17B10 Q99714 1/20 0.36
ALOX5AP P20292 1/20 0.35
TYMS P04818 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29045407 0.87 THRB (0.56) THRBTHRATSHRHTTHPGD
SCHEMBL30830303 0.86 THRB (0.57) THRBTHRATSHRHPGDKDM4E
SCHEMBL146450 0.83 THRB (0.70) THRBTHRATSHRHPGDKDM4E
SCHEMBL31679622 0.83 THRB (0.52) THRBTHRAHTTHPGDHSD17B10
SCHEMBL27093552 0.82 THRB (0.60) THRBTHRATSHRHPGDKDM4E
SCHEMBL29416762 0.82 GABRA1 (0.47) THRBTHRAGABRA1GABRB2TSHR
SCHEMBL11240569 0.82 THRB (0.63) THRBTHRAHPGDKDM4EMAPT
SCHEMBL19181573 0.82 GABRA1 (0.47) THRBTHRAGABRA1GABRB2TSHR
SCHEMBL28396369 0.80 GABRA1 (0.46) GABRA1GABRB2TSHRHTTHPGD
SCHEMBL6219545 0.80 THRB (0.61) THRBTHRAHPGDKDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0843218-B1 Photosensitive composition FUJIFILM CORP (JP) 2008-01-16 EP disclosed
CN-1942432-A Phenylethanolamine derivatives as beta-2 agonists PFIZER LTD (US) 2007-04-04 CN disclosed
US-6746812-B2 USING A FLUORINE-CONTAINING POLYMER IN THE PHOTOSENSITIVE RESIN COMPOSITION TO GIVE HIGH CONTRAST OF PRINTING PLATE IMAGE WHILE MAINTAINING PRESS LIFE FUJI PHOTO FILM CO., LTD. (JP) 2004-06-08 US disclosed
EP-1314552-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2003-05-28 EP disclosed
EP-0949539-B1 Photosensitive resin composition FUJI PHOTO FILM CO LTD (JP) 2003-03-19 EP disclosed
EP-1225478-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 2002-07-24 EP disclosed
US-6423467-B1 USEFUL IN A LITHOGRAPHIC PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 2002-07-23 US disclosed
US-20020086233-A1 Useful in a lithographic printing plates FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020051929-A1 Using a fluorine-containing polymer in the photosensitive resin composition to give high contrast of printing plate image while maintaining press life FUJIFILM CORPORATION (JP) 2002-05-02 US disclosed
US-6132931-A A FLUORINE-CONTAINING POLYURETHANE COPOLYMER; FORMING A HIGH CONTRAST IMAGE, INHIBITING HALATION, A SAFE LIGHT TOLERANCE AND A WIDE DEVELOPMENT LATITUDE, WITHOUT LOWERING THE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US disclosed
US-6110640-A Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-08-29 US disclosed
EP-0949539-A2 Photosensitive resin composition FUJI PHOTO FILM CO., LTD. (JP) 1999-10-13 EP disclosed
EP-0843218-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1998-05-20 EP disclosed