Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.50 |
| ▸ | TSHR | P16473 | 5/20 | 0.50 |
| ▸ | TTR | P02766 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.50 |
| ▸ | RECQL | P46063 | 3/20 | 0.50 |
| ▸ | THRB | P10828 | 3/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 4/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.40 |
| ▸ | CASP1 | P29466 | 2/20 | 0.38 |
| ▸ | LCK | P06239 | 4/20 | 0.37 |
| ▸ | ERN1 | O75460 | 1/20 | 0.37 |
| ▸ | SRC | P12931 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19655045 | 0.84 | MCL1 (0.42) | HSD17B10TSHRTTRALDH1A1CYP3A4 | |
| SCHEMBL25142209 | 0.84 | PTGS1 (0.49) | HSD17B10TSHRTTRALDH1A1CYP3A4 | |
| SCHEMBL1122678 | 0.78 | ALDH1A1 (0.45) | HSD17B10TSHRALDH1A1CYP3A4HPGD | |
| SCHEMBL11001155 | 0.76 | HSD17B10 (0.52) | HSD17B10TSHRTTRALDH1A1CYP3A4 | |
| SCHEMBL10738398 | 0.74 | ALDH1A1 (0.50) | TSHRALDH1A1CYP3A4LMNAPOLB | |
| SCHEMBL15107889 | 0.74 | TP53 (0.39) | TSHRALDH1A1 | |
| SCHEMBL574999 | 0.74 | ALDH1A1 (0.52) | HSD17B10TSHRTTRALDH1A1CYP3A4 | |
| SCHEMBL2879838 | 0.73 | TRPA1 (0.52) | HSD17B10TSHRALDH1A1HPGDLCK | |
| SCHEMBL665222 | 0.72 | ALDH1A1 (0.44) | HSD17B10TSHRALDH1A1CYP3A4ALOX15 | |
| SCHEMBL7160153 | 0.71 | GSR (0.50) | HSD17B10TSHRTTRALDH1A1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119350748-A | Surgical auxiliary instrument material with antibacterial performance and preparation method thereof | 哈尔滨工业大学（威海） | 2025-01-24 | — | — | CN | claimed |
| CN-119350748-B | Surgical auxiliary instrument material with antibacterial performance and preparation method thereof | 哈尔滨工业大学（威海） | 2026-03-17 | — | — | CN | disclosed |
| EP-4702010-A1 | PHOTOACTIVE COMPOUNDS | Merck Patent GmbH (DE) | 2026-03-04 | — | — | EP | disclosed |
| CN-119350748-A | Surgical auxiliary instrument material with antibacterial performance and preparation method thereof | 哈尔滨工业大学（威海） | 2025-01-24 | — | — | CN | disclosed |
| CN-119350748-A | Surgical auxiliary instrument material with antibacterial performance and preparation method thereof | 哈尔滨工业大学（威海） | 2025-01-24 | — | — | CN | disclosed |
| WO-2024223739-A1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2024-10-31 | — | — | WO | disclosed |
| US-9335631-B2 | Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-05-10 | — | — | US | disclosed |
| US-20150168833-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ORGANIC LAYER USING THE COMPOSITION, AND DISPLAY DEVICE COMPRISING THE ORGANIC LAYER | SAMSUNG DISPLAY CO., LTD (KR) | 2015-06-18 | — | — | US | disclosed |
| EP-1913444-B1 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA (US) | 2013-01-16 | — | — | EP | disclosed |
| EP-1960837-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ Electronic Materials USA Corp. (US) | 2008-08-27 | — | — | EP | disclosed |
| WO-2007054813-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-18 | — | — | WO | disclosed |
| US-20070105040-A1 | Developable undercoating composition for thick photoresist layers | AZ ELECTRONIC MATERIALS USA CORP. | 2007-05-10 | — | — | US | disclosed |
| WO-2007007176-A2 | PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015080-A1 | Photoresist composition for imaging thick films | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| EP-1434091-A1 | CHEMICAL-AMPLIFICATION-TYPE POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION | Clariant International Ltd. (CH) | 2004-06-30 | — | — | EP | disclosed |
| US-20040033438-A1 | Chemical-amplication-type positive radiation-sensitive resin composition | AZ ELECTRONIC MATERIALS USA CORP. | 2004-02-19 | — | — | US | disclosed |
| US-6537719-B1 | Both a resin and a photosensitive material, wherein a fluorescent material is incorporated | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-25 | — | — | US | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-1087260-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-03-28 | — | — | EP | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |