Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | BACE1 | P56817 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.41 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.41 |
| ▸ | LCK | P06239 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 2/20 | 0.38 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4480267 | 0.82 | ALDH1A1 (0.50) | TRPA1TSHRHSD17B10ALDH1A1ESR2 | |
| SCHEMBL9622274 | 0.81 | LCK (0.61) | TSHRHSD17B10CA2CA1BACE1 | |
| SCHEMBL9622273 | 0.81 | LCK (0.61) | TSHRHSD17B10CA2CA1BACE1 | |
| SCHEMBL11001027 | 0.79 | TSHR (0.52) | TSHRHSD17B10CA2CA1BACE1 | |
| SCHEMBL30620702 | 0.78 | ALDH1A1 (0.58) | TSHRHSD17B10ALDH1A1KMT2ARAB9A | |
| SCHEMBL14890 | 0.78 | ALDH1A1 (0.58) | TSHRHSD17B10ALDH1A1KMT2ARAB9A | |
| SCHEMBL170797 | 0.78 | LCK (0.64) | TRPA1TSHRHSD17B10CA2CA1 | |
| SCHEMBL29403669 | 0.78 | LCK (0.64) | TRPA1TSHRHSD17B10CA2CA1 | |
| SCHEMBL29433282 | 0.77 | ALDH1A1 (0.64) | TSHRHSD17B10CA2CA1BACE1 | |
| SCHEMBL115626 | 0.77 | ALDH1A1 (0.64) | TSHRHSD17B10CA2CA1BACE1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113130991-B | Electrolyte, battery and formation method | 中创新航技术研究院(江苏)有限公司 | 2022-06-10 | — | — | CN | claimed |
| CN-113130991-A | Electrolyte, battery and formation method | 凯博能源科技有限公司 | 2021-07-16 | — | — | CN | claimed |
| US-6423458-B1 | — | — | None | — | — | US | disclosed |
| EP-4702010-A1 | PHOTOACTIVE COMPOUNDS | Merck Patent GmbH (DE) | 2026-03-04 | — | — | EP | disclosed |
| CN-119709577-A | Recombinant strain for expressing phenolic acid decarboxylase as well as construction method and application thereof | 南京工业大学 | 2025-03-28 | — | — | CN | disclosed |
| WO-2024223739-A1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2024-10-31 | — | — | WO | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230152698-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| EP-0871070-A2 | Positive working photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1998-10-14 | — | — | EP | disclosed |
| US-5759736-A | Photoresist composition | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-06-02 | — | — | US | disclosed |
| EP-0703498-B1 | Photosensitive resin composition and method for forming a photoresist pattern | MITSUBISHI CHEM CORP (JP) | 1997-12-29 | — | — | EP | disclosed |
| US-5698362-A | CONTAINING A TRIARYLMETHANE DERIVATIVE; HIGH RESOLUTION, EXCELLENT IN DEPTH OF FOCUS AND PATTERN PROFILE, STORAGE STABLE | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-12-16 | — | — | US | disclosed |
| EP-0800116-A1 | Photoresist composition | Mitsubishi Chemical Corporation (JP) | 1997-10-08 | — | — | EP | disclosed |
| EP-0722121-A1 | Photosensitive planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-17 | — | — | EP | disclosed |
| EP-0703498-A1 | Photosensitive resin composition and method for forming a photoresist pattern | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-03-27 | — | — | EP | disclosed |
| US-5376498-A | Blend of an alkali-soluble resin, compound that generates an acid upon irradiation, functional aromatic compound and a phenolic compound | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-12-27 | — | — | US | disclosed |
| EP-0542572-A1 | Negative type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-05-19 | — | — | EP | disclosed |