SCHEMBL460181

SCHEMBL460181

C1CCCCCCCCC1.C1CCCCCCCCC1.C1CCCCCCCCC1.C=C(C)C(=O)OCO.C=C(C)C(=O)OCO

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
ALDH1A1 P00352 3/20 0.48
THRB P10828 1/20 0.47
TDP1 Q9NUW8 2/20 0.34
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
HTT P42858 1/20 0.34
EPHX1 P07099 1/20 0.33
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14054416 1.00 TSHR (0.50) TSHRALDH1A1THRBTDP1POLB
SCHEMBL36180 0.93
SCHEMBL30365675 0.93 TSHR (0.56) TSHRALDH1A1THRBTDP1POLB
SCHEMBL453052 0.93 TSHR (0.56) TSHRALDH1A1THRBTDP1POLB
Methyl Alcohol SCHEMBL8414271 0.90 TSHR (0.54) TSHRALDH1A1THRBTDP1POLB
Ammonia Solution, Strong SCHEMBL28243650 0.90
SCHEMBL29035001 0.90 THRB (0.48) TSHRALDH1A1THRBTDP1POLB
Propane SCHEMBL3445673 0.88 THRB (0.54) TSHRALDH1A1THRBTDP1POLB
Propane SCHEMBL15475973 0.88 THRB (0.54) TSHRALDH1A1THRBTDP1POLB
Aziridine SCHEMBL5828076 0.86 TSHR (0.47) TSHRALDH1A1THRBTDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117941905-A Antifouling moisture-permeable waterproof vamp and preparation method thereof 泉州盛步新材料科技有限公司 2024-04-30 CN claimed
CN-117903379-A High-wear-resistance resin for marble and preparation method thereof 顾家家居股份有限公司 2024-04-19 CN claimed
US-6117609-A MICROCAPSULES COMPRISE A PHOTOPOLYMERIZABLE UNSATURATED COMPOUND AND A PHOSPHITE HAVING AT LEAST ONE THIO LINKAGE; COLORANT AS A PHOTOSENSITIZER; HARDENING USING LOW ENERGY; ANTISOILANTS BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-09-12 US claimed
US-6025112-A COMPOSITION HIGHLY SENSITIVE TO NEAR INFRARED RADIATION AND VISIBLE LIGHT HAVING SPECIFIED WAVELENGTH, COMPRISING UNSATURATED COMPOUND BASE MATERIAL, METAL ARENE PHOTOPOLYMERIZATION INITIATOR, ANILINE COMPOUND BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-02-15 US claimed
EP-0884650-A1 Photosensitive recording material using microcapsules Brother Kogyo Kabushiki Kaisha (JP) 1998-12-16 EP claimed
CN-117941905-A Antifouling moisture-permeable waterproof vamp and preparation method thereof 泉州盛步新材料科技有限公司 2024-04-30 CN disclosed
CN-117903379-A High-wear-resistance resin for marble and preparation method thereof 顾家家居股份有限公司 2024-04-19 CN disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023219047-A1 INSULATIVE ADHESIVE TAPE 東洋インキSCホールディングス株式会社 2023-11-16 WO disclosed
CN-105907328-B Radiation curable pressure sensitive adhesive sheet 3M创新有限公司 2020-10-13 CN disclosed
EP-3098226-B1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2018-12-12 EP disclosed
US-10100070-B2 Borate-based base generator, and base-reactive composition comprising such base generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2018-10-16 US disclosed
US-6900250-B2 Polymerizable composition TOYO INK MFG. CO., LTD. (JP) 2005-05-31 US disclosed
US-20040019128-A1 Curable white ink KONICA CORPORATION (JP) 2004-01-29 US disclosed
US-20030212162-A1 Photopolymerization using photoinitiators TOYO INK MFG. CO., LTD. (JP) 2003-11-13 US disclosed
US-6242149-B1 LIGHT SENSITIVE ELEMENTS CURED WITH RADIATION, RADICAL POLYMERIZATION, PHOTOPOLYMERIZATION, ENCAPSULATION BROTHER KOGYO KABUSHIKI KAISHA (JP) 2001-06-05 US disclosed
US-6117609-A MICROCAPSULES COMPRISE A PHOTOPOLYMERIZABLE UNSATURATED COMPOUND AND A PHOSPHITE HAVING AT LEAST ONE THIO LINKAGE; COLORANT AS A PHOTOSENSITIZER; HARDENING USING LOW ENERGY; ANTISOILANTS BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-09-12 US disclosed
US-6025112-A COMPOSITION HIGHLY SENSITIVE TO NEAR INFRARED RADIATION AND VISIBLE LIGHT HAVING SPECIFIED WAVELENGTH, COMPRISING UNSATURATED COMPOUND BASE MATERIAL, METAL ARENE PHOTOPOLYMERIZATION INITIATOR, ANILINE COMPOUND BROTHER KOGYO KABUSHIKI KAISHA (JP) 2000-02-15 US disclosed
EP-0924569-A1 Fast-curing photosensitive composition and recording sheet Brother Kogyo Kabushiki Kaisha (JP) 1999-06-23 EP disclosed
EP-0884650-A1 Photosensitive recording material using microcapsules Brother Kogyo Kabushiki Kaisha (JP) 1998-12-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10100070-B2 Borate-based base generator, and base-reactive composition comprising such base generator BLM, HPRT1, BROX TSHR 1373/4885ALDH1A1 2646/4885THRB 2506/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.