Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | MPI | P34949 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | ESR1 | P03372 | 6/20 | 0.47 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.47 |
| ▸ | NQO1 | P15559 | 1/20 | 0.47 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.47 |
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.47 |
| ▸ | PDE4B | Q07343 | 3/20 | 0.46 |
| ▸ | PDE4A | P27815 | 2/20 | 0.46 |
| ▸ | PDE4C | Q08493 | 2/20 | 0.46 |
| ▸ | PDE4D | Q08499 | 2/20 | 0.46 |
| ▸ | NQO2 | P16083 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29120666 | 0.86 | ESR1 (0.54) | TRPM4MAPTKDM4EMEN1ALDH1A1 | |
| SCHEMBL30689894 | 0.86 | ESR1 (0.54) | TRPM4MAPTKDM4EMEN1ALDH1A1 | |
| SCHEMBL9463316 | 0.84 | TRPM4 (0.52) | TRPM4MAPTKDM4EMEN1ALDH1A1 | |
| SCHEMBL374808 | 0.83 | ALOX5 (0.52) | TRPM4ESR1ESR2NQO1ALOX5 | |
| SCHEMBL5478446 | 0.83 | CNR2 (0.50) | TRPM4MEN1KMT2ANQO1ALOX5 | |
| SCHEMBL7915025 | 0.82 | MEN1 (0.56) | TRPM4MAPTKDM4EMEN1ALDH1A1 | |
| SCHEMBL5461208 | 0.81 | CYP11B1 (0.59) | KDM4ECYP1A2CYP3A4CYP2D6CYP2C9 | |
| SCHEMBL3170245 | 0.81 | KMT2A (0.46) | MAPTKDM4EMEN1ALDH1A1HPGD | |
| SCHEMBL22688521 | 0.81 | POLB (0.50) | TRPM4MAPTKDM4EMEN1ALDH1A1 | |
| SCHEMBL17726753 | 0.81 | CRHBP (0.47) | TRPM4MAPTKDM4EMEN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3414276-A1 | INHERENTLY HEALING POLYCARBONATE RESINS | SABIC Global Technologies B.V. (NL) | 2018-12-19 | — | — | EP | disclosed |
| WO-2017137951-A1 | INHERENTLY HEALING POLYCARBONATE RESINS | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2017-08-17 | — | — | WO | disclosed |
| US-9045587-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140363768-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8846846-B2 | Naphthalene derivative, resist bottom layer material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-30 | — | — | US | disclosed |
| CN-101173155-B | Heat-sensitive pressure-sensitive adhesive and heat-sensitive adhesive material | RICOH CO LTD | 2012-12-19 | — | — | CN | disclosed |
| US-20120064725-A1 | NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-15 | — | — | US | disclosed |