SCHEMBL4606584

SCHEMBL4606584

C=CC(=O)OCCOC(=O)C(C)=CCCO

nearest known ligand 0.53

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.53
ALDH1A1 P00352 4/20 0.48
TP53 P04637 3/20 0.48
HIF1A Q16665 3/20 0.48
HSD17B10 Q99714 1/20 0.48
HPGD P15428 1/20 0.44
CYP3A4 P08684 2/20 0.44
THRB P10828 3/20 0.41
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28033746 0.94 TSHR (0.55) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL5025149 0.86 TSHR (0.49) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL8382801 0.84 TSHR (0.59) TSHRALDH1A1TP53HIF1AHSD17B10
Acrylic Acid SCHEMBL27653758 0.83 TSHR (0.44) TSHRHPGDCYP2D6CYP2C19
SCHEMBL27778296 0.83 TSHR (0.52) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL27966881 0.83 THRB (0.50) TSHRALDH1A1THRBCYP2D6CYP2C19
SCHEMBL7035391 0.82 TSHR (0.39) TSHRTHRBCYP2D6CYP2C19
SCHEMBL4606590 0.82 TSHR (0.61) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL11096534 0.81 TSHR (0.56) TSHRALDH1A1TP53HIF1AHSD17B10
SCHEMBL2336872 0.81 TSHR (0.56) TSHRALDH1A1TP53HIF1AHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117188191-A Non-close-packed photonic crystal structure chromogenic fabric and preparation method thereof 浙江理工大学 2023-12-08 CN claimed
EP-1036103-B2 MODIFIED POLYURETHANE HOTMELT ADHESIVE HENKEL AG & CO KGAA (DE) 2008-07-16 EP claimed
EP-1036103-B1 MODIFIED POLYURETHANE HOTMELT ADHESIVE HENKEL KGAA (DE) 2002-09-11 EP claimed
JP-2001525429-A 2001-12-11 JP claimed
EP-1036103-A1 MODIFIED POLYURETHANE HOTMELT ADHESIVE Henkel Kommanditgesellschaft auf Aktien (DE) 2000-09-20 EP claimed
WO-1999028363-A1 MODIFIED POLYURETHANE HOTMELT ADHESIVE HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 1999-06-10 WO claimed
CN-117188191-A Non-close-packed photonic crystal structure chromogenic fabric and preparation method thereof 浙江理工大学 2023-12-08 CN disclosed
CN-103464223-B A kind of process aromatic sulphonic acid waste water anion exchange resin and preparation method thereof Kai Rui environmental protection Science and Technology Co., Ltd. (CN) 2015-12-02 CN disclosed
US-6879026-B2 Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film MITSUI CHEMICALS, INC. (JP) 2005-04-12 US disclosed
EP-1477505-A1 POLYESTER Kyowa Hakko Chemical Co., Ltd. (JP) 2004-11-17 EP disclosed
US-20030219960-A1 Surface protecting adhesive film for semiconductor wafer and processing method for semiconductor wafer using said adhesive film MITSUI CHEMICALS, INC. (JP) 2003-11-27 US disclosed
EP-1216831-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-06-26 EP disclosed