Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO2 | P16083 | 2/20 | 0.47 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.47 |
| ▸ | NQO1 | P15559 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.40 |
| ▸ | TUBB | P07437 | 1/20 | 0.40 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.40 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.40 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.40 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.40 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29678864 | 0.82 | ALDH1A1 (0.52) | NQO2NQO1MAPTSMN1; SMN2HPGD | |
| SCHEMBL5963190 | 0.82 | ALDH1A1 (0.52) | NQO2NQO1MAPTSMN1; SMN2HPGD | |
| SCHEMBL15496954 | 0.81 | TRPA1 (0.50) | NQO2TRPA1NQO1HPGDALDH1A1 | |
| SCHEMBL5686498 | 0.79 | TUBB1 (0.67) | NQO2CYP1A2TUBB4ATUBBTUBA3C | |
| SCHEMBL5686446 | 0.79 | TUBB1 (0.67) | NQO2CYP1A2TUBB4ATUBBTUBA3C | |
| SCHEMBL5686445 | 0.79 | TUBB1 (0.67) | NQO2CYP1A2TUBB4ATUBBTUBA3C | |
| SCHEMBL18499915 | 0.77 | NQO2 (0.41) | NQO2TRPA1NQO1MAPTSMN1; SMN2 | |
| SCHEMBL7835432 | 0.76 | NQO1 (0.50) | NQO2NQO1MAPTSMN1; SMN2HPGD | |
| SCHEMBL2784519 | 0.76 | CYP1A2 (0.55) | MAPTHPGDALDH1A1CYP1A2HIF1A | |
| SCHEMBL8197756 | 0.75 | NQO1 (0.54) | NQO2NQO1MAPTSMN1; SMN2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250224645-A1 | ELECTROPHORETIC MEDIUM COMPRISING PARTICLES HAVING A PIGMENT CORE AND A POLYMERIC SHELL | E INK CORPORATION | 2025-07-10 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | disclosed |
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20140065546-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-03-06 | — | — | US | disclosed |
| EP-1614727-B1 | A method for ink jet recording | KONICA CORP (JP) | 2008-03-05 | — | — | EP | disclosed |
| US-7168802-B2 | Ink composition and a method for ink jet recording | KONICA CORPORATION (JP) | 2007-01-30 | — | — | US | disclosed |
| EP-1321497-B1 | An ink composition and a method for ink jet recording | KONISHIROKU PHOTO IND (JP) | 2006-04-12 | — | — | EP | disclosed |
| EP-1614727-A1 | A method for ink jet recording | KONICA CORPORATION (JP) | 2006-01-11 | — | — | EP | disclosed |
| US-20050146544-A1 | Ink composition and a method for ink jet recording | KONDO AI (JP) | 2005-07-07 | — | — | US | disclosed |
| US-6910764-B2 | Image recording method, energy radiation curable ink and image recording apparatus | KONICA CORPORATION (JP) | 2005-06-28 | — | — | US | disclosed |
| US-20030222961-A1 | Image recording method, energy radiation curable ink and image recording apparatus | KONICA CORPORATION (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030149130-A1 | Ink composition and a method for ink jet recording | KONICA CORPORATION (JP) | 2003-08-07 | — | — | US | disclosed |
| EP-1321497-A1 | An ink composition and a method for ink jet recording | KONICA CORPORATION (JP) | 2003-06-25 | — | — | EP | disclosed |