Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 8/20 | 0.66 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.66 |
| ▸ | RAB9A | P51151 | 3/20 | 0.66 |
| ▸ | NPC1 | O15118 | 4/20 | 0.64 |
| ▸ | TP53 | P04637 | 2/20 | 0.64 |
| ▸ | PKM | P14618 | 1/20 | 0.64 |
| ▸ | TOP1 | P11387 | 2/20 | 0.62 |
| ▸ | TERT | O14746 | 1/20 | 0.62 |
| ▸ | LMNA | P02545 | 1/20 | 0.61 |
| ▸ | GAA | P10253 | 1/20 | 0.61 |
| ▸ | HTT | P42858 | 1/20 | 0.61 |
| ▸ | TOP2A | P11388 | 1/20 | 0.59 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.59 |
| ▸ | KCNMA1 | Q12791 | 3/20 | 0.58 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.58 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.58 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.58 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.58 |
| ▸ | EIF4H | Q15056 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29101462 | 0.92 | MEN1 (0.57) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL19630945 | 0.92 | HDAC1 (0.66) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL6799613 | 0.91 | MEN1 (0.58) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL4946074 | 0.88 | NPC1 (0.73) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL1470784 | 0.88 | NPC1 (0.73) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL6029925 | 0.86 | NPC1 (0.82) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL5314528 | 0.84 | NPC1 (0.59) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL11868617 | 0.84 | PTGS1 (0.72) | MEN1KMT2ARAB9ANPC1LMNA | |
| SCHEMBL6541906 | 0.84 | RXFP1 (0.56) | MEN1KMT2ARAB9ANPC1TP53 | |
| SCHEMBL3860173 | 0.84 | TOP1 (0.59) | MEN1KMT2ARAB9ANPC1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20200192227-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200181317-A1 | Bisphenol A-Free Crosslinked Polymer Composition | WARNER BABCOCK INSTITUTE FOR GREEN CHEMISTRY, LLC (US) | 2020-06-11 | — | — | US | disclosed |
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2853386-B1 | SUBSTRATE AND TOUCH PANEL MEMBER USING SAME | TORAY INDUSTRIES (JP) | 2017-10-25 | — | — | EP | disclosed |
| US-20170299965-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2017-10-19 | — | — | US | disclosed |
| US-9788420-B2 | Substrate and touch panel member using same | TORAY INDUSTRIES, INC. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9510444-B2 | — | — | 2016-11-29 | — | — | US | disclosed |
| US-20160320700-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20090123867-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER | TORAY INDUSTRIES, INC. (JP) | 2009-05-14 | — | — | US | disclosed |
| US-20090123867-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER | TORAY INDUSTRIES, INC. (JP) | 2009-05-14 | — | — | US | disclosed |
| US-20090068587-A1 | (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | NEC CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| US-7455948-B2 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-7455948-B2 | Photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| EP-1909142-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION ENHANCER | TORAY INDUSTRIES, INC. (JP) | 2008-04-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090123867-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER | PCNA, TERB1, SMC2 | MEN1 4387/4885KMT2A 56/4885RAB9A 2276/4885 |
| US-20090068587-A1 | (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | MMAB, DNMT3A, MAT1A | MEN1 1408/4885KMT2A 185/4885RAB9A 2251/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.