SCHEMBL4628896

SCHEMBL4628896

CCC1(CC)NC1(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4626480 0.67
SCHEMBL28017232 0.58
Ethylamine SCHEMBL342521 0.57
Ethylamine SCHEMBL635354 0.57
Ethylamine SCHEMBL979530 0.57
Ethylamine SCHEMBL28448202 0.57
Ethylamine SCHEMBL342520 0.57 DNM1 (0.33)
Ethylamine SCHEMBL4518356 0.57 DNM1 (0.33)
Propane SCHEMBL7708559 0.54
Propane SCHEMBL28670151 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1535976-B1 Composition for film formation, method for preparing the composition, and method for forming insulating film JSR CORP (JP) 2008-01-16 EP disclosed
EP-1535976-A1 Composition for film formation, method for preparing the composition, and method for forming insulating film JSR Corporation (JP) 2005-06-01 EP disclosed
US-20050112386-A1 Composition for film formation, method for preparing the composition, and method for forming insulating film JSR CORPORATION (JP) 2005-05-26 US disclosed