SCHEMBL4646487

SCHEMBL4646487

COCc1c2ccccc2c(COC)c2c1ccc1ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B10 Q99714 3/20 0.43
▸ TSHR P16473 3/20 0.43
▸ L3MBTL1 Q9Y468 2/20 0.43
▸ CYP3A4 P08684 1/20 0.43
▸ HPGD P15428 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ CASP1 P29466 1/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ CASP7 P55210 1/20 0.43
▸ ATM Q13315 1/20 0.43
▸ HIF1A Q16665 1/20 0.43
▸ HPRT1 P00492 1/20 0.40
▸ MAPT P10636 2/20 0.39
▸ TDP1 Q9NUW8 4/20 0.38
▸ CYP2A6 P11509 2/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ KDM1A O60341 1/20 0.36
▸ MAOA P21397 1/20 0.36
▸ CYP1A2 P05177 2/20 0.35
▸ CYP2C9 P11712 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1334758 0.80 ALDH1A1 (0.43) MAPK1RAB9AMAPTTDP1ALDH1A1
SCHEMBL29808111 0.80 ALDH1A1 (0.43) MAPK1RAB9AMAPTTDP1ALDH1A1
SCHEMBL30219496 0.77 HSD17B10 (0.38) HSD17B10TSHRL3MBTL1CYP3A4HPGD
SCHEMBL7629059 0.76 HSD17B10 (0.47) HSD17B10TSHRL3MBTL1CYP3A4HPGD
SCHEMBL4646633 0.75 HTR2A (0.54) HSD17B10L3MBTL1CYP3A4HPGDCASP1
SCHEMBL736665 0.74 HSD17B10 (0.41) HSD17B10TSHRRAB9AHIF1AHPRT1
SCHEMBL15037542 0.74 ALDH1A1 (0.42) HSD17B10HPGDMAPK1RAB9AMAPT
SCHEMBL13497454 0.74 HTR1B (0.50) HPGDTDP1ALDH1A1KDM4E
SCHEMBL18819386 0.73 MAPT (0.40) HSD17B10TSHRCYP3A4HPGDHIF1A
SCHEMBL2218400 0.73 HSD17B10 (0.63) HSD17B10HPGDHIF1AMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4091578-B1 METHOD FOR PRODUCING PLATE DENTURE TOKUYAMA DENTAL CORP (JP) 2024-10-09 — — EP disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 — — US disclosed
US-20230137898-A1 METHOD OF PRODUCING PLATE DENTURE, CURABLE COMPOSITION FOR STEREOLITHOGRAPHY, AND PLATE DENTURE PRODUCTION KIT TOKUYAMA DENTAL CORPORATION (JP) 2023-05-04 — — US disclosed
EP-4091578-A1 METHOD FOR PRODUCING PLATE DENTURE, CURABLE STEREOLITHOGRAPHIC COMPOSITION, AND PLATE DENTURE PRODUCTION KIT Tokuyama Dental Corporation (JP) 2022-11-23 — — EP disclosed
EP-1591098-B1 Cationically curable composition for dental use TOKUYAMA CORP (JP) 2008-08-13 — — EP disclosed
US-7365106-B2 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2008-04-29 — — US disclosed
EP-1431315-B1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORP (JP) 2007-10-17 — — EP disclosed
US-20050250868-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-10 — — US disclosed
EP-1591098-A1 Cationically curable composition for dental use TOKUYAMA CORPORATION (JP) 2005-11-02 — — EP disclosed
US-20040186195-A1 Photopolymerization initiator and photopolymerizable composition TOKUYAMA CORPORATION (JP) 2004-09-23 — — US disclosed
EP-1431315-A2 Photopolymerization initiator and photopolymerizable composition Tokuyama Corporation (JP) 2004-06-23 — — EP disclosed
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