Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.36 |
| ▸ | ESR1 | P03372 | 1/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.36 |
| ▸ | KDR | P35968 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL442926 | 0.86 | ALDH1A1 (0.54) | HCAR2ALDH1A1LMNATSHRESR1 | |
| SCHEMBL27984406 | 0.85 | HCAR2 (0.40) | HCAR2ALDH1A1LMNATSHRCHRM1 | |
| SCHEMBL4672633 | 0.84 | NAAA (0.52) | HCAR2ALDH1A1LMNATSHRATM | |
| SCHEMBL23581545 | 0.82 | NAAA (0.55) | HCAR2ALDH1A1LMNATSHR | |
| SCHEMBL29754027 | 0.82 | NAAA (0.55) | HCAR2ALDH1A1LMNATSHR | |
| SCHEMBL9487820 | 0.82 | NAAA (0.55) | HCAR2ALDH1A1LMNATSHR | |
| SCHEMBL1548335 | 0.82 | NAAA (0.55) | HCAR2ALDH1A1LMNATSHR | |
| SCHEMBL6062638 | 0.82 | HCAR2 (0.41) | HCAR2ALDH1A1LMNATSHRCHRM1 | |
| SCHEMBL26327281 | 0.82 | HCAR2 (0.41) | HCAR2ALDH1A1LMNATSHRCHRM1 | |
| SCHEMBL204763 | 0.82 | POLB (0.44) | HCAR2ALDH1A1LMNATSHRCHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110874025-B | Diluent composition, substrate processing method and semiconductor element manufacturing method | 易案爱富科技有限公司 | 2024-05-24 | — | — | CN | claimed |
| US-11220659-B2 | Thinner composition | ENF TECHNOLOGY CO., LTD. (KR) | 2022-01-11 | — | — | US | claimed |
| US-11046634-B2 | High-purity carboxylic acid ester and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-06-29 | — | — | US | claimed |
| CN-110874025-A | Thinner composition, substrate processing method and semiconductor device manufacturing method | 易案爱富科技有限公司 | 2020-03-10 | — | — | CN | claimed |
| US-20200071640-A1 | THINNER COMPOSITION | ENF TECHNOLOGY CO., LTD. (KR) | 2020-03-05 | — | — | US | claimed |
| US-20180273465-A1 | HIGH-PURITY CARBOXYLIC ACID ESTER AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-09-27 | — | — | US | claimed |
| CN-108137476-A | High-purity carboxylate and its manufacturing method | 三菱瓦斯化学株式会社 | 2018-06-08 | — | — | CN | claimed |
| US-9568830-B2 | Thinner composition for improving coating and removing performance of resist | DONGWOO FINE-CHEM CO., LTD. (KR) | 2017-02-14 | — | — | US | claimed |
| US-20150355545-A1 | THINNER COMPOSITION FOR IMPROVING COATING AND REMOVING PERFORMANCE OF RESIST | DONGWOO FINE-CHEM CO., LTD. (KR) | 2015-12-10 | — | — | US | claimed |
| WO-2006119283-A2 | ANTI-ODOR COMPOSITIONS AND THERAPEUTIC USE | YU RUEY J (US) | 2006-11-09 | — | — | WO | claimed |
| US-20060251597-A1 | ANTI-ODOR COMPOSITIONS AND THERAPEUTIC USE | YU RUEY J | 2006-11-09 | — | — | US | claimed |
| CN-116560190-B | Resist material and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-26 | — | — | CN | disclosed |
| US-12625429-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-12 | — | — | US | disclosed |
| US-12596303-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-07 | — | — | US | disclosed |
| US-20250230356-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2025-07-17 | — | — | US | disclosed |
| EP-1101761-A2 | Process for producing 3-phenyluracil compounds | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-05-23 | — | — | EP | disclosed |
| EP-1095935-A1 | 6-Hydroxy-5,6-dihydrouracils as herbicides | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-05-02 | — | — | EP | disclosed |
| US-6146816-A | DEVELOPER LIQUID FOR NEGATIVE WORKING RADIATION SENSITIVE COMPOSITIONS WHICH INCLUDES AN ALKYL ESTER OF A HYDROXY CARBOXYLIC ACID. | AGFA-GEVAERT, N.V. (BE) | 2000-11-14 | — | — | US | disclosed |
| EP-1006412-A1 | Development of radiation sensitive compositions | AGFA-GEVAERT N.V. (BE) | 2000-06-07 | — | — | EP | disclosed |
| US-3974207-A | Method for producing methacrylic esters | Instyut Ciezkiej Syntesy Organiczej "Blachownia" (PO) | 1976-08-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12625429-B2 | Resist composition and pattern forming process | NAF1, CLIC1, H1-4 | HCAR2 898/4885ALDH1A1 1604/4885LMNA 2432/4885 |
| US-12596303-B2 | Resist composition and pattern forming process | CBR1, CCR1, NAF1 | HCAR2 440/4885ALDH1A1 2963/4885LMNA 2549/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.