Acrylic Acid Ethyl Ester

Acrylic Acid Ethyl Ester

SCHEMBL467440

C=C(CC)C(=O)O.C=C(CCC1CO1)C(=O)O.C=CC(=O)OCC

nearest known ligand 0.33

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Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33
TSHR P16473 2/20 0.33
HPGD P15428 1/20 0.33
HCAR2 Q8TDS4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid Ethyl Ester SCHEMBL6271486 0.87 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL8512431 0.85 ALDH1A1 (0.36) ALDH1A1
SCHEMBL16754766 0.84 ALDH1A1 (0.43) ALDH1A1
Ethylene SCHEMBL4364784 0.82 TSHR (0.54) ALDH1A1TSHRHPGDHCAR2
SCHEMBL1299543 0.82 ALDH1A1 (0.47) ALDH1A1TSHRHPGD
Acrylic Acid Ethyl Ester SCHEMBL7106311 0.82 TSHR (0.46) ALDH1A1TSHRHPGDHCAR2
Acrylic Acid Ethyl Ester SCHEMBL3159975 0.82 TSHR (0.46) ALDH1A1TSHRHPGDHCAR2
Acrylic Acid Ethyl Ester SCHEMBL1299439 0.81 ALDH1A1 (0.59) ALDH1A1TSHRHPGD
SCHEMBL29102695 0.81 TSHR (0.47) ALDH1A1TSHRHPGDHCAR2
SCHEMBL4268620 0.80 ALOX15 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 320 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6153719-A PHOSPHORUS-CONTAINING COMPOUND HAVING AT LEAST ONE P--OH GROUP AND AT LEAST ONE ORGANIC MOIETY CHARACTERIZED BY THE PRESENCE OF AN ETHYLENICALLY UNSATURATED GROUP;PARTICULARLY USEFUL AS A SEALER FOR AN ADHESIVE JOINT. LORD CORPORATION (US) 2000-11-28 US claimed
US-20240018277-A1 PHOTOHARDENABLE COMPOSITIONS, METHODS, AND A STABILIZER QUADRATIC 3D, INC. 2024-01-18 US disclosed
US-20230323015-A1 Formulation and Processing of Degradable High Tg Epoxy Composite that can be degradable at Extremely Low Temperature CNPC USA CORPORATION 2023-10-12 US disclosed
WO-2023196026-A1 FORMULATION AND PROCESSING OF DEGRADABLE HIGH Tg EPOXY COMPOSITE THAT CAN BE DEGRADABLE AT EXTREMELY LOW TEMPERATURE CNPC USA CORPORATION (US) 2023-10-12 WO disclosed
WO-2023009204-A1 COMPOSITIONS, METHODS FOR FORMING AN ARTICLE, AND PRODUCTS THEREOF QUADRATIC 3D, INC. (US) 2023-02-02 WO disclosed
US-20230022703-A1 NOVEL BI-CONTINUOS EPOXY MICROSTRUCTURE FOR FABRICATION OF DEGRADABLE THERMOSET COMPOSITE USED IN HTHP DOWNHOLE CONDITIONS CNPC USA Corp. 2023-01-26 US disclosed
WO-2021154897-A1 PHOTOHARDENABLE COMPOSITIONS INCLUDING AN UPCONVERTING COMPONENT AND METHODS QUADRATIC 3D, INC. (US) 2021-08-05 WO disclosed
EP-3017001-B1 CURABLE COMPOSITION AND PROCESS FOR THE MANUFACTURE OF AN EPOXY THERMOSET RHODIA OPERATIONS (FR) 2019-06-19 EP disclosed
US-20190169357-A1 LATENT CATALYST MIXTURE FOR EPOXY/ANHYDRIDE COMPOSITIONS DOW GLOBAL TECHNOLOGIES LLC (US) 2019-06-06 US disclosed
EP-3491043-A1 LATENT CATALYST MIXTURE FOR EPOXY/ANHYDRIDE COMPOSITIONS Dow Global Technologies LLC (US) 2019-06-05 EP disclosed
US-5310796-A Polymer to glass LORD CORPORATION (US) 1994-05-10 US disclosed
US-5019605-A Hardener, smoke suppressant, filler MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-05-28 US disclosed
EP-0388037-A2 Low density self-extinguishing epoxide composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-09-19 EP disclosed
US-4394403-A AROMATIC IODONIUM SALT OF COMPLEX ION AS PHOTOINITIATOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-07-19 US disclosed
US-4378277-A AROMATIC IODONIUM COMPLEX SALT PHOTOINITIATOR; A PHOTOSENSITIZER MINNESOTA MINING & MANUFACTURING COMPANY (US) 1983-03-29 US disclosed
US-4318766-A CURED COATING USING IODONIUM OR SULFONIUM PHOTOINITIATOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-03-09 US disclosed
US-4256828-A SULFONIUM OR IODONIUM COMPLEX SALTS AS PHOTOINITIATORS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1981-03-17 US disclosed
US-4219377-A Photocurable epoxy composition having improved flexibility comprising vinyl terminated acrylonitrile-butadiene polymer MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1980-08-26 US disclosed
US-4115295-A EPOXIDE FUNCTIONAL, HYDROXY FUNCTIONAL, DIELECTRICS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1978-09-19 US disclosed
US-4090936-A AN EPOXIDE, ADDITION POLYMER, PHOTOINITIATOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1978-05-23 US disclosed