SCHEMBL467609

SCHEMBL467609

Nc1nc(N)n(-c2ccc(N3CCC(N4CCCC4)CC3)c(C(F)(F)F)c2)n1

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NOTUM Q6P988 3/20 0.42
L3MBTL3 Q96JM7 5/20 0.41
L3MBTL1 Q9Y468 5/20 0.41
AXL P30530 2/20 0.40
FGFR1 P11362 1/20 0.37
FLT1 P17948 1/20 0.37
MBTD1 Q05BQ5 3/20 0.36
SOS1 Q07889 1/20 0.35
HRH3 Q9Y5N1 3/20 0.35
NPY2R P49146 1/20 0.35
RET P07949 2/20 0.34
ROS1 P08922 2/20 0.34
FLT3 P36888 2/20 0.34
EML4 Q9HC35 2/20 0.34
ALK Q9UM73 2/20 0.34
EGFR P00533 1/20 0.34
TP53BP1 Q12888 2/20 0.33
L3MBTL4 Q8NA19 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL467659 0.86 AXL (0.49) L3MBTL3L3MBTL1AXLFGFR1FLT1
SCHEMBL468621 0.84 L3MBTL3 (0.43) L3MBTL3L3MBTL1AXLMBTD1HRH3
SCHEMBL467833 0.83 AXL (0.47) L3MBTL3L3MBTL1AXLFGFR1FLT1
SCHEMBL28039190 0.82 L3MBTL3 (0.42) L3MBTL3L3MBTL1AXLMBTD1HRH3
SCHEMBL28823415 0.80 L3MBTL3 (0.61) L3MBTL3L3MBTL1MBTD1HRH3TP53BP1
SCHEMBL467792 0.80 AXL (0.44) L3MBTL3L3MBTL1AXLFGFR1FLT1
SCHEMBL467478 0.79 AXL (0.42) AXL
SCHEMBL10157709 0.78 MAPT (0.47) NOTUML3MBTL3L3MBTL1MBTD1HRH3
SCHEMBL4937299 0.77 MAPT (0.46) NOTUML3MBTL3L3MBTL1MBTD1HRH3
SCHEMBL27769653 0.77 AXL (0.42) L3MBTL3L3MBTL1AXLHRH3FLT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2387395-A1 AXL INHIBITORS FOR USE IN COMBINATION THERAPY FOR PREVENTING, TREATING OR MANAGING METASTATIC CANCER Rigel Pharmaceuticals, Inc. (US) 2011-11-23 EP disclosed
US-8040491-B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method NIKON CORPORATION (JP) 2011-10-18 US disclosed