⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2103825 | 0.79 | ALDH1A1 (0.33) | — | |
| SCHEMBL2102625 | 0.79 | — | — | |
| SCHEMBL21353784 | 0.74 | MGLL (0.33) | — | |
| SCHEMBL2103917 | 0.74 | — | — | |
| SCHEMBL2102921 | 0.74 | — | — | |
| SCHEMBL4966302 | 0.74 | — | — | |
| SCHEMBL1448489 | 0.74 | — | — | |
| SCHEMBL2102452 | 0.73 | — | — | |
| SCHEMBL22291564 | 0.71 | ALDH1A1 (0.33) | — | |
| SCHEMBL2102077 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2386561-B1 | Methods for producing alkoxyhydrosilanes | KANEKA CORP (JP) | 2016-01-13 | — | — | EP | disclosed |
| EP-2392600-B1 | Polymer having a reactive silicon-containing group, methods for its preparation and a curable composition comprising the polymer | KANEKA CORP (JP) | 2015-12-23 | — | — | EP | disclosed |
| EP-2308884-B1 | METHOD FOR PRODUCING -HETERO-SUBSTITUTED ALKYLHALOHYDROSILANE AND USE THEREOF | KANEKA CORP (JP) | 2015-05-06 | — | — | EP | disclosed |
| CN-102174188-B | Polymer comprising reactive silicon group | KANEKA CORP | 2014-11-26 | — | — | CN | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20120196981-A1 | METHOD FOR PRODUCING a-HETERO-SUBSTITUTED ALKYLHALOHYDROSILANE AND USE THEREOF | KANEKACORPORATION (JP) | 2012-08-02 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| EP-2392600-A1 | Polymer having a reactive silicon-containing group, methods for its preparation and a curable composition comprising the polymer | Kaneka Corporation (JP) | 2011-12-07 | — | — | EP | disclosed |
| EP-2386561-A1 | Methods for producing alkoxyhydrosilanes | Kaneka Corporation (JP) | 2011-11-16 | — | — | EP | disclosed |
| US-8039142-B2 | Battery case | SONY CORPORATION (JP) | 2011-10-18 | — | — | US | disclosed |
| CN-102174188-A | Polymer comprising reactive silcon group | KANEKA CORP | 2011-09-07 | — | — | CN | disclosed |
| US-20110207886-A1 | Method for Producing a-hereto-Substituted Alkylhalohydrosilane and Use Thereof | KANEKA CORPORATION (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| CN-102140108-A | Method for producing alkylhalohydrosilane compound | KANEKA CORP | 2011-08-03 | — | — | CN | disclosed |
| CN-102037000-A | Process for producing alpha-hetero-substituted alkylhalohydrosilanes and use thereof | KANEKA CORP | 2011-04-27 | — | — | CN | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |