⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2103111 | 0.83 | — | — | |
| SCHEMBL2103917 | 0.77 | — | — | |
| SCHEMBL1448489 | 0.77 | — | — | |
| SCHEMBL21353784 | 0.77 | MGLL (0.33) | — | |
| SCHEMBL2102921 | 0.77 | — | — | |
| SCHEMBL467755 | 0.74 | — | — | |
| SCHEMBL2103825 | 0.74 | ALDH1A1 (0.33) | — | |
| SCHEMBL2102625 | 0.74 | — | — | |
| SCHEMBL2103140 | 0.72 | — | — | |
| SCHEMBL21047503 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130052349-A1 | ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY, INC. | 2013-02-28 | — | — | US | claimed |
| WO-2008002415-A2 | PRECURSORS FOR DEPOSITING SILICON CONTAINING FILMS AND PROCESSES THEREOF | PRAXAIR TECHNOLOGY, INC. (US) | 2008-01-03 | — | — | WO | claimed |
| US-20070299274-A1 | Organometallic compounds | PRAXAIR TECHNOLOGY, INC. | 2007-12-27 | — | — | US | claimed |
| CN-107312028-B | Halogenated organoaminosilane precursors and methods of depositing thin films comprising the same | 弗萨姆材料美国有限责任公司 | 2023-04-14 | — | — | CN | disclosed |
| EP-2574611-B1 | Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PROD & CHEM (US) | 2016-03-23 | — | — | EP | disclosed |
| US-8993072-B2 | Halogenated organoaminosilane precursors and methods for depositing films comprising same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-03-31 | — | — | US | disclosed |
| EP-2574611-A1 | Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-04-03 | — | — | EP | disclosed |
| US-20130078392-A1 | HALOGENATED ORGANOAMINOSILANE PRECURSORS AND METHODS FOR DEPOSITING FILMS COMPRISING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-03-28 | — | — | US | disclosed |
| US-20130052349-A1 | ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY, INC. | 2013-02-28 | — | — | US | disclosed |
| US-20130047890-A1 | ORGANOMETALLIC COMPOUNDS | PRAXAIR TECHNOLOGY, INC. | 2013-02-28 | — | — | US | disclosed |
| US-8318966-B2 | Organometallic compounds | PRAXAIR TECHNOLOGY, INC. (US) | 2012-11-27 | — | — | US | disclosed |
| US-6869638-B2 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | ADVANCED TEHNOLOGY MATERIALS, INC. (US) | 2005-03-22 | — | — | US | disclosed |
| EP-0864573-B1 | Silacyclopentadiene derivatives | CHISSO CORP (JP) | 2004-06-23 | — | — | EP | disclosed |
| EP-1373278-A1 | METALLOAMIDE AND AMINOSILANE PRECURSORS FOR CVD FORMATION OF DIELECTRIC THIN FILMS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2004-01-02 | — | — | EP | disclosed |
| WO-2003084969-A1 | SILICON SOURCE REAGENT COMPOSITIONS, AND METHOD OF MAKING AND USING SAME FOR MICROELECTRONIC DEVICE STRUCTURE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2003-10-16 | — | — | WO | disclosed |
| US-20020187644-A1 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | MORGAN STANLEY SENIOR FUNDING, INC. | 2002-12-12 | — | — | US | disclosed |
| US-20020180028-A1 | Silicon source reagent compositions, and method of making and using same for microelectronic device structure | ADVANCED TECHNOLOGY MATERIALS, INC. | 2002-12-05 | — | — | US | disclosed |
| WO-2002079211-A1 | METALLOAMIDE AND AMINOSILANE PRECURSORS FOR CVD FORMATION OF DIELECTRIC THIN FILMS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2002-10-10 | — | — | WO | disclosed |
| US-6005128-A | Silacyclopentadiene derivative | CHISSO CORPORATION (JP) | 1999-12-21 | — | — | US | disclosed |
| EP-0864573-A2 | Silacyclopentadiene derivative | CHISSO CORPORATION (JP) | 1998-09-16 | — | — | EP | disclosed |