SCHEMBL472143

SCHEMBL472143

CCOC(=O)C1(C)CC=CCC1

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
BRD4 O60885 1/20 0.39
SLC22A1 O15245 2/20 0.38
OPRM1 P35372 8/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
OPRD1 P41143 3/20 0.35
OPRK1 P41145 3/20 0.35
SLC6A4 P31645 1/20 0.35
ADRA1A P35348 1/20 0.35
KCNH2 Q12809 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
POLB P06746 1/20 0.33
KDM4E B2RXH2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12751319 0.89 BRD4 (0.45) BRD4SLC22A1OPRM1SMN1; SMN2OPRD1
SCHEMBL16086032 0.88 BRD4 (0.37) BRD4SLC22A1OPRM1SMN1; SMN2OPRD1
SCHEMBL16086031 0.88 BRD4 (0.37) BRD4SLC22A1OPRM1SMN1; SMN2OPRD1
SCHEMBL17616814 0.81 SCN9A (0.34)
SCHEMBL472066 0.80 CYP3A4 (0.33) SMN1; SMN2KDM4E
SCHEMBL16471455 0.80 BRD4 (0.40) BRD4SLC22A1OPRM1SMN1; SMN2OPRD1
SCHEMBL13755065 0.80 SLC22A1 (0.39) SLC22A1OPRM1SMN1; SMN2OPRD1OPRK1
SCHEMBL472139 0.79 NPSR1 (0.34) SMN1; SMN2MEN1KMT2A
SCHEMBL27910816 0.79 BRD4 (0.42) BRD4SLC22A1OPRM1SMN1; SMN2OPRD1
SCHEMBL2289941 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104822376-A 3-cyclohexenyl and cyclohexyl substituted indole and indazole compounds as ROR γ T inhibitors and uses thereof MERCK SHARP & DOHME 2015-08-05 CN disclosed
US-8664414-B2 Process for producing epoxy compound SHOWA DENKO K.K. (JP) 2014-03-04 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND SHOWA DENKO K.K. (JP) 2012-02-02 US disclosed
EP-2412712-A1 METHOD FOR PRODUCING EPOXY COMPOUND Showa Denko K.K. (JP) 2012-02-01 EP disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120029217-A1 PROCESS FOR PRODUCING EPOXY COMPOUND NOX4, NOX5, NOXO1 BRD4 672/4885SLC22A1 4363/4885OPRM1 597/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 BRD4 2061/4885SLC22A1 4837/4885OPRM1 1086/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.