Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.58 |
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.58 |
| ▸ | PTGS2 | P35354 | 5/20 | 0.57 |
| ▸ | PTGS1 | P23219 | 4/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.53 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.53 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.53 |
| ▸ | CXCR1 | P25024 | 2/20 | 0.53 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | ALB | P02768 | 1/20 | 0.53 |
| ▸ | ESR1 | P03372 | 1/20 | 0.53 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.53 |
| ▸ | RARB | P10826 | 1/20 | 0.53 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.53 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.53 |
| ▸ | HTR2A | P28223 | 1/20 | 0.53 |
| ▸ | NR1I3 | Q14994 | 1/20 | 0.53 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27513747 | 0.85 | ALDH1A1 (0.55) | ALDH1A1GAAL3MBTL1TSHRHDAC3 | |
| SCHEMBL59197 | 0.84 | PTGS2 (0.74) | ALDH1A1PTGS2PTGS1LMNACYP2C9 | |
| SCHEMBL10443326 | 0.84 | ALDH1A1 (0.50) | ALDH1A1GAAL3MBTL1PTGS2TSHR | |
| SCHEMBL5608671 | 0.82 | ALDH1A1 (0.52) | ALDH1A1GAAL3MBTL1TSHRHDAC3 | |
| SCHEMBL27278135 | 0.82 | EPHX1 (0.55) | ALDH1A1GAAL3MBTL1TSHRHPGD | |
| SCHEMBL15442422 | 0.81 | ALDH1A1 (0.47) | ALDH1A1GAAL3MBTL1TSHRHDAC3 | |
| SCHEMBL8812406 | 0.81 | ALDH1A1 (0.59) | ALDH1A1GAAL3MBTL1TSHRHDAC3 | |
| SCHEMBL16508372 | 0.80 | PTGS2 (0.63) | ALDH1A1PTGS2PTGS1LMNACYP2C9 | |
| SCHEMBL23035655 | 0.79 | ALDH1A1 (0.61) | ALDH1A1GAAL3MBTL1LMNATSHR | |
| SCHEMBL16755643 | 0.79 | ALDH1A1 (0.61) | ALDH1A1GAAL3MBTL1LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2492746-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2019-11-20 | — | — | EP | disclosed |
| EP-2492747-B1 | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| US-RE46765-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| CN-104199255-B | Chemistry amplification negative resist composition and patterning method for EB or EUV lithographic printings | 信越化学工业株式会社 | 2018-03-13 | — | — | CN | disclosed |
| US-RE46736-E1 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| EP-2360525-B1 | Chemically amplified positive resist composition and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360527-B1 | Patterning process using EB or EUV lithography | SHINETSU CHEMICAL CO (JP) | 2017-08-23 | — | — | EP | disclosed |
| EP-2360526-B1 | Chemically amplified negative resist composition for E beam or EUV lithography and patterning process | SHINETSU CHEMICAL CO (JP) | 2017-08-16 | — | — | EP | disclosed |
| EP-2256552-B1 | Negative resist composition and patterning process using the same | SHINETSU CHEMICAL CO (JP) | 2017-07-12 | — | — | EP | disclosed |
| EP-2244124-A2 | Patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-7759502-B2 | Useful for inhibiting the aggregation of amyloid protein to form amyloid deposit | THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA (US) | 2010-07-20 | — | — | US | disclosed |
| US-20100167207-A1 | Chemically amplified positive resist composition and resist patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| EP-2202577-A1 | Chemically amplified positive resist composition and resist patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-06-30 | — | — | EP | disclosed |
| EP-2146245-A2 | Resist composition and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-20100009299-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20080108840-A1 | Stilbene Derivatives And Their Use For Binding And Imaging Amyloid Plaques | TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA | 2008-05-08 | — | — | US | disclosed |
| EP-0386243-A1 | PLATINUM (II) COMPLEXES | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1990-09-12 | — | — | EP | disclosed |
| US-4237298-A | Aromatic acetic acid derivatives having sulfur atom at alpha-position and process for their preparation | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1980-12-02 | — | — | US | disclosed |
| US-4144248-A | Aromatic acetic acid derivatives having sulfur atom at alpha-position and process for their preparation | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1979-03-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080108840-A1 | Stilbene Derivatives And Their Use For Binding And Imaging Amyloid Plaques | APP, APBA1, PSEN1 | ALDH1A1 3258/4885GAA 1173/4885L3MBTL1 2796/4885 |
| US-20100009299-A1 | Resist composition and patterning process | ARF4, FGFR2, ARF5 | ALDH1A1 2706/4885GAA 4147/4885L3MBTL1 2561/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.