Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | PTPN1 | P18031 | 5/20 | 0.39 |
| ▸ | PTPRC | P08575 | 2/20 | 0.39 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.39 |
| ▸ | SYK | P43405 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.37 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.37 |
| ▸ | SLC15A1 | P46059 | 1/20 | 0.37 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12184225 | 0.89 | MAOB (0.43) | KMT2AMEN1PTPN1PTPRCMAOB | |
| SCHEMBL13559131 | 0.87 | ALDH1A1 (0.53) | ALDH1A1KMT2AMEN1PTPN1PTPRC | |
| SCHEMBL10062523 | 0.84 | ELANE (0.42) | CTRB1L3MBTL1TDP1 | |
| SCHEMBL20924713 | 0.81 | ALDH1A1 (0.41) | ALDH1A1KMT2ACTRB1TDP1SMN1; SMN2 | |
| SCHEMBL20924759 | 0.81 | ALDH1A1 (0.43) | ALDH1A1KMT2AMEN1PTPN1PTPRC | |
| SCHEMBL47314 | 0.81 | THRB (0.38) | ALDH1A1TSHRLMNA | |
| SCHEMBL22662346 | 0.81 | TSHR (0.30) | TSHR | |
| SCHEMBL12186473 | 0.79 | HTT (0.36) | TSHR | |
| SCHEMBL1143936 | 0.78 | TSHR (0.33) | ALDH1A1TSHR | |
| SCHEMBL12439401 | 0.78 | TSHR (0.33) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2479614-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORP (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |
| US-9513548-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-9513548-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-9513548-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2016-12-06 | — | — | US | disclosed |
| US-20160179003-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160179003-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160179003-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2016-06-23 | — | — | US | disclosed |
| CN-102498439-B | Radiation-sensitive resin composition, method for forming resist pattern, polymer, and polymerizable compound | JSR CORP | 2015-03-11 | — | — | CN | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| EP-2479614-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-2479614-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR Corporation (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| WO-2012002470-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR株式会社 (JP) | 2012-01-05 | — | — | WO | disclosed |
| WO-2011125684-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER AND COMPOUND | JSR株式会社 (JP) | 2011-10-13 | — | — | WO | disclosed |
| WO-2011034176-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR株式会社 (JP) | 2011-03-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120082934-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND | RER1, RFT1, RAD51 | ALDH1A1 1635/4885KMT2A 2095/4885MEN1 1547/4885 |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | RER1, RDX, PRXL2A | ALDH1A1 1383/4885KMT2A 1173/4885MEN1 4432/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.