Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK14 | Q16539 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13423634 | 1.00 | MAPK14 (0.36) | MAPK14CYP3A4TSHR | |
| SCHEMBL15383244 | 0.86 | MAPK14 (0.30) | MAPK14CYP3A4TSHR | |
| SCHEMBL259015 | 0.84 | — | — | |
| SCHEMBL12519174 | 0.84 | — | — | |
| SCHEMBL21469294 | 0.82 | — | — | |
| SCHEMBL13880038 | 0.80 | — | — | |
| SCHEMBL47536 | 0.78 | — | — | |
| SCHEMBL10215878 | 0.76 | — | — | |
| SCHEMBL10208013 | 0.76 | — | — | |
| SCHEMBL12460138 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314945-A1 | NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-10317794-B2 | Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, image display device, organic electroluminescent element, colorant, and method for producing colorant | FUJIFILM CORPORATION (JP) | 2019-06-11 | — | — | US | disclosed |
| US-20180210338-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-9897922-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2018-02-20 | — | — | US | disclosed |
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9664827-B2 | Colored composition, method of producing color filter using the same, color filter and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-20170146904-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD OF MANUFACTURING COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2017-05-25 | — | — | US | disclosed |
| US-20170146904-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD OF MANUFACTURING COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2017-05-25 | — | — | US | disclosed |
| US-9650493-B2 | Coloring composition, cured film, color filter, pattern forming method, method for manufacturing color filter, solid-state imaging device, and image display device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-9650493-B2 | Coloring composition, cured film, color filter, pattern forming method, method for manufacturing color filter, solid-state imaging device, and image display device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20110039207-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20110039207-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20100143844-A1 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100094030-A1 | Preparation Of Alicyclic Diepoxides | PROMERUS LLC (US) | 2010-04-15 | — | — | US | disclosed |
| US-20100081080-A1 | POLYMER COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100081088-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100035178-A1 | Negative resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. | 2010-02-11 | — | — | US | disclosed |
| US-20090297980-A1 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2009-12-03 | — | — | US | disclosed |
| US-20090274976-A1 | Negative resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-11-05 | — | — | US | disclosed |
| US-7598017-B2 | Negative resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100081088-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME | ASIC1, RER1, GRIN1 | MAPK14 2968/4885CYP3A4 3282/4885TSHR 3650/4885 |
| US-20100094030-A1 | Preparation Of Alicyclic Diepoxides | MVD, DLD, DHPS | MAPK14 3420/4885CYP3A4 919/4885TSHR 4529/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.