SCHEMBL479331

SCHEMBL479331

CC(=CC12CCCCC(CC1)CC2)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL701575 0.91
SCHEMBL4804374 0.85 CYP1A2 (0.30)
SCHEMBL4804368 0.85 CYP1A2 (0.30)
SCHEMBL7940709 0.81 CYP1A2 (0.32)
SCHEMBL158981 0.80 APLNR (0.30)
SCHEMBL1089100 0.80 APLNR (0.30)
SCHEMBL479280 0.80 APLNR (0.30)
SCHEMBL4799351 0.80 APLNR (0.30)
SCHEMBL1155136 0.71 LMNA (0.33)
SCHEMBL702223 0.71 LMNA (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8183313-B2 Light guide including surface-treated resin OMRON CORPORATION (JP) 2012-05-22 US disclosed
EP-2082872-B1 LIGHT GUIDE HAVING A SURFACE-TREATED RESIN, AND PRODUCTION METHOD THEREOF OMRON TATEISI ELECTRONICS CO (JP) 2012-02-01 EP disclosed
US-20100304153-A1 SURFACE-TREATED RESIN, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME OMRON CORPORATION (JP) 2010-12-02 US disclosed
EP-2082872-A1 SURFACE-TREATED RESIN, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME OMRON Corporation, a corporation of Japan (JP) 2009-07-29 EP disclosed