SCHEMBL158981

SCHEMBL158981

CC(=CC12CCC(CC1)C2)C(=O)O

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
APLNR P35414 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4799351 1.00 APLNR (0.30) APLNR
SCHEMBL4804368 0.93 CYP1A2 (0.30)
SCHEMBL4804374 0.93 CYP1A2 (0.30)
SCHEMBL1089100 0.92 APLNR (0.30) APLNR
SCHEMBL479280 0.92 APLNR (0.30) APLNR
SCHEMBL7940709 0.89 CYP1A2 (0.32)
SCHEMBL701575 0.88
SCHEMBL4086304 0.83
SCHEMBL562824 0.83
SCHEMBL6905424 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 604 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12516014-B2 Photoresist composition including a chrysene compound, method of forming a pattern using the same, and method of fabricating 6-nitrochrysene SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-01-06 US claimed
US-20250253337-A1 POSITIVE ELECTRODE BINDER FOR LITHIUM ION BATTERIES SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) 2025-08-07 US claimed
US-20230357123-A1 PHOTORESIST COMPOSITION INCLUDING A CHRYSENE COMPOUND, METHOD OF FORMING A PATTERN USING THE SAME, AND METHOD OF FABRICATING 6-NITROCHRYSENE SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) 2023-11-09 US claimed
US-11530344-B2 Reactive hot melt adhesive composition and use thereof HENKEL AG & CO. KGAA (DE) 2022-12-20 US claimed
US-20200148795-A1 STYRENE-FREE COATING COMPOSITIONS FOR PACKAGING ARTICLES SUCH AS FOOD AND BEVERAGE CONTAINERS SWIMC LLC (US) 2020-05-14 US claimed
EP-2367881-B1 HIGH TEMPERATURE ACRYLIC SHEET ARKEMA FRANCE (FR) 2018-07-18 EP claimed
US-9587149-B2 Pressure sensitive adhesive copolymer compositions HEXION INC. (US) 2017-03-07 US claimed
US-20160122525-A1 COMPOSITE SYSTEM WITH HIGH IMPACT STRENGTH AND A HIGH SOFTENING POINT EVONIK ROEHM GMBH (DE) 2016-05-05 US claimed
US-20160054480-A1 POLARIZING PLATE Shanjin Optoelectronics (Nanjing) Co., Ltd. (CN) 2016-02-25 US claimed
US-9138383-B1 Nanogel materials and methods of use thereof THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2015-09-22 US claimed
US-7084227-B2 Photosensitive polymer and chemically amplified photoresist composition containing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-08-01 US claimed
US-20040096776-A1 Composition for hologram-recording material, hologram-recording medium, and process for producing the same Daiso, Co., Ltd. (JP) 2004-05-20 US claimed
EP-0927229-B1 POWDER COATING COMPOSITIONS AND COATED SUBSTRATES WITH MULTILAYERED COATINGS PPG IND OHIO INC (US) 2002-04-17 EP claimed
US-6277917-B1 CURABLE THERMOSETTING POWDER COATING BLENDS FOR CLEAR COATS OF EPOXY ACRYLIC COPOLYMERS AND POLYCARBOXYLIC ACID CROSSLINKING AGENT; GIVEN GLASS TRANSITION TEMPERATURE, STYRENE CONTENT AND MOLECULAR WEIGHT RANGES; CHIP RESISTANCE PPG INDUSTRIES OHIO, INC. 2001-08-21 US claimed
EP-0990666-B1 Emulsion polymerised copolymers with cyclic or polycyclic monomers with higher glass transition temperature CONSORTIUM ELEKTROCHEM IND (DE) 2001-06-06 EP claimed
EP-0990666-A1 Emulsion polymerised copolymers with cyclic or polycyclic monomers with higher glass transition temperature Consortium für elektrochemische Industrie GmbH (DE) 2000-04-05 EP claimed
EP-0927229-A1 POWDER COATING COMPOSITIONS AND COATED SUBSTRATES WITH MULTILAYERED COATINGS PPG INDUSTRIES, INC. (US) 1999-07-07 EP claimed
WO-1998012268-A1 POWDER COATING COMPOSITIONS AND COATED SUBSTRATES WITH MULTILAYERED COATINGS PPG INDUSTRIES, INC. (US) 1998-03-26 WO claimed
EP-0590573-B1 Resin for plastic lens HITACHI CHEMICAL CO LTD (JP) 1998-01-07 EP claimed
EP-0408420-B1 Star copolymers and their manufacture process ATOCHEM ELF SA (FR) 1994-04-06 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230357123-A1 PHOTORESIST COMPOSITION INCLUDING A CHRYSENE COMPOUND, METHOD OF FORMING A PATTERN USING THE SAME, AND METHOD OF FABRICATING 6-NITROCHRYSENE CRY1, NOS1, NOP56 APLNR 2271/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.