SCHEMBL4801277

SCHEMBL4801277

C=C(C(=O)O)c1ccc(C2CCC(C(C)=O)CC2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
HAO1 Q9UJM8 1/20 0.40
CYP2C9 P11712 1/20 0.39
AKR1C3 P42330 1/20 0.39
AKR1C1 Q04828 1/20 0.39
HDAC8 Q9BY41 2/20 0.38
HDAC6 Q9UBN7 2/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC3 O15379 1/20 0.38
HDAC11 Q96DB2 1/20 0.38
ALDH1A1 P00352 2/20 0.38
LMNA P02545 1/20 0.38
MAPT P10636 1/20 0.38
HDAC2 Q92769 1/20 0.35
ESR2 Q92731 1/20 0.35
SLC6A4 P31645 1/20 0.34
PDE4A P27815 1/20 0.34
PDE4B Q07343 1/20 0.34
PDE4C Q08493 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1088238 0.85 NPC1 (0.44) NPC1RAB9AHAO1CYP2C9AKR1C3
SCHEMBL1088809 0.84 ESR2 (0.53) NPC1RAB9AHAO1CYP2C9AKR1C3
SCHEMBL4801518 0.84 NPC1 (0.41) NPC1RAB9AHAO1CYP2C9AKR1C3
SCHEMBL28334528 0.82 ESR2 (0.52) NPC1RAB9AHAO1CYP2C9AKR1C3
SCHEMBL1089207 0.82 HAO1 (0.57) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL2444359 0.82 RAB9A (0.46) NPC1RAB9AHAO1CYP2C9AKR1C3
SCHEMBL4802628 0.81 HAO1 (0.42) NPC1RAB9AHAO1CYP2C9AKR1C3
SCHEMBL1088758 0.80 HAO1 (0.59) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL1088367 0.80 HAO1 (0.59) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL1088682 0.80 HAO1 (0.42) NPC1RAB9AHAO1CYP2C9HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed