⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11691076 | 0.79 | — | — | |
| SCHEMBL1244237 | 0.75 | ALDH1A1 (0.31) | — | |
| SCHEMBL24440550 | 0.72 | ALDH1A1 (0.32) | — | |
| SCHEMBL17924892 | 0.70 | MGLL (0.38) | — | |
| SCHEMBL1318483 | 0.67 | ALDH1A1 (0.42) | — | |
| SCHEMBL11493656 | 0.67 | KDM4E (0.34) | — | |
| SCHEMBL14037107 | 0.67 | ADORA2B (0.32) | — | |
| SCHEMBL10167160 | 0.65 | POLB (0.35) | — | |
| SCHEMBL21787983 | 0.59 | ADORA2B (0.41) | — | |
| SCHEMBL25061686 | 0.57 | ALDH1A1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2008060998-A1 | INDOLE SULFONAMIDES AS SFRP-1 MODULATORS | WYETH (US) | 2008-05-22 | — | — | WO | claimed |
| US-8262945-B2 | Stabilization of photochromic systems | BASF SE (DE) | 2012-09-11 | — | — | US | disclosed |
| US-7786199-B2 | Flame-retardants | CIBA SPECIALTY CHEMICALS CORP. (US) | 2010-08-31 | — | — | US | disclosed |
| US-20090312464-A1 | Stabilizer mixtures | GUGUMUS FRANCOIS | 2009-12-17 | — | — | US | disclosed |
| US-20090289236-A1 | STABILIZATION OF PHOTOCHROMIC SYSTEMS | DESTRO MARA | 2009-11-26 | — | — | US | disclosed |
| US-20080269383-A1 | Flame-Retardants | CIBA SPECIALTY CEMICALS HOLDING INC. (CH) | 2008-10-30 | — | — | US | disclosed |
| US-7425403-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-7332266-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-02-19 | — | — | US | disclosed |
| US-20080027160-A1 | Weatherability of flame retardant polyolefin | ZINGG JURG | 2008-01-31 | — | — | US | disclosed |
| US-20040110096-A1 | Composition for forming antireflection film for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2004-06-10 | — | — | US | disclosed |
| EP-1378796-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2004-01-07 | — | — | EP | disclosed |