Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 13/20 | 0.56 |
| ▸ | CA1 | P00915 | 12/20 | 0.56 |
| ▸ | MMP1 | P03956 | 6/20 | 0.56 |
| ▸ | MMP2 | P08253 | 6/20 | 0.56 |
| ▸ | MMP9 | P14780 | 6/20 | 0.56 |
| ▸ | MMP8 | P22894 | 6/20 | 0.56 |
| ▸ | MMP13 | P45452 | 6/20 | 0.56 |
| ▸ | F2 | P00734 | 4/20 | 0.50 |
| ▸ | PRSS1 | P07477 | 4/20 | 0.50 |
| ▸ | PRSS2 | P07478 | 4/20 | 0.50 |
| ▸ | PRSS3 | P35030 | 4/20 | 0.50 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3140088 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3140314 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3135152 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3139152 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3137344 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3137331 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL24140 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL8437168 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL332726 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL715861 | 1.00 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146021-A1 | PROCESS OF PREPARATION OF METHYLENE DICARBOXYLATES | CRACKLESS MONOMERS CO., LTD (TW) | 2026-05-28 | — | — | US | claimed |
| EP-4748824-A1 | PROCESS OF PREPARATION OF METHYLENE DICARBOXYLATES | Crackless Monomers Co., Ltd (TW) | 2026-05-27 | — | — | EP | claimed |
| CN-122079775-A | Preparation process of methylene dicarboxylic acid ester | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080517-A | Plastic base standard substance containing fluorine compound, and preparation method and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| EP-4735152-A2 | SYSTEM AND APPARATUS FOR PFAS DESTRUCTION | BASF CORPORATION (US) | 2026-05-06 | — | — | EP | claimed |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | claimed |
| US-12577133-B2 | Process for removal of PFAS from water | CHROMAFORA AB (SE) | 2026-03-17 | — | — | US | claimed |
| EP-4705043-A1 | SOLID WASTE REMEDIATION PROCESS | JGB Innovations Pty Ltd (AU) | 2026-03-11 | — | — | EP | claimed |
| US-12535739-B2 | Method of forming photoresist pattern | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-01-27 | — | — | US | claimed |
| US-20250369960-A1 | PER- AND POLYFLUORINATED ALKYL COMPOUND (PFAS) BINDING PROTEINS AND USES THEREOF | ALLONNIA LLC (US) | 2025-12-04 | — | — | US | claimed |
| US-20060100327-A1 | Methods of making an antistatic agent | CITIBANK, N.A., AS COLLATERAL AGENT | 2006-05-11 | — | — | US | claimed |
| EP-1632478-A1 | METHOD FOR PRODUCING PURIFIED 2-CYANOACRYLATE | TOAGOSEI CO., LTD. (JP) | 2006-03-08 | — | — | EP | claimed |
| WO-2005100307-A2 | METHODS OF MAKING AN ANTISTATIC AGENT | GENERAL ELECTRIC COMPANY (US) | 2005-10-27 | — | — | WO | claimed |
| US-20050228194-A1 | Methods of making an antistatic agent | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2005-10-13 | — | — | US | claimed |
| EP-1448712-A1 | FLAME RETARDANT RESINOUS COMPOSITIONS AND METHOD | General Electric Company, (a New York Corporation) (US) | 2004-08-25 | — | — | EP | claimed |
| US-6613824-B2 | Composition comprising aromatic carbonate, polymer derived from vinyl aromatic, unsaturated nitrile or (meth)acrylate ester monomers, rubber modified graft copolymer, organic phosphorus species, antidrip agent, perfluoroalkanesulfonate | GENERAL ELECTRIC COMPANY | 2003-09-02 | — | — | US | claimed |
| US-20030109650-A1 | Flame retardant resinous compositions and method | GENERAL ELECTRIC COMPANY | 2003-06-12 | — | — | US | claimed |
| WO-2003042303-A1 | FLAME RETARDANT RESINOUS COMPOSITIONS AND METHOD | GENERAL ELECTRIC COMPANY (A NEW YORK CORPORATION) (US) | 2003-05-22 | — | — | WO | claimed |
| US-5380789-A | Punching | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-01-10 | — | — | US | claimed |
| US-4810613-A | Blocked monomer and polymers therefrom for use as photoresists | HOECHST CELANESE CORPORATION (US) | 1989-03-07 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12535739-B2 | Method of forming photoresist pattern | DSTN, PFAS, FASN | CA2 4072/4885CA1 2898/4885MMP1 4086/4885 |
| US-12577133-B2 | Process for removal of PFAS from water | PFAS, SRMS, SLCO4C1 | CA2 979/4885CA1 795/4885MMP1 3695/4885 |
| US-20260146021-A1 | PROCESS OF PREPARATION OF METHYLENE DICARBOXYLATES | FTO, PHOSPHO1, AFF1 | CA2 651/4885CA1 1029/4885MMP1 3833/4885 |
| US-20050228194-A1 | Methods of making an antistatic agent | MTX1, GPX4, CA2 | CA2 3/4885CA1 16/4885MMP1 522/4885 |
| US-20260104643-A1 | METHOD OF FORMING PHOTORESIST PATTERN | DSTN, PFAS, DNTT | CA2 3477/4885CA1 2276/4885MMP1 4496/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.