SCHEMBL4804512

SCHEMBL4804512

O=C1C=C(Cc2ccc(O)cc2)C(=O)N1

nearest known ligand 0.46

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.46
ESR2 Q92731 2/20 0.46
KEAP1 Q14145 1/20 0.36
CAPN1 P07384 1/20 0.36
CA2 P00918 2/20 0.35
CAMK2A Q9UQM7 1/20 0.35
GSK3B P49841 1/20 0.35
IDH1 O75874 1/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ABAT P80404 1/20 0.34
PTPN1 P18031 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9508340 0.90 MAOA (0.35) PTPN1
SCHEMBL6809866 0.84 ESR1 (0.50) ESR1ESR2CA2KDM4EALDH1A1
SCHEMBL3791542 0.81 CYP3A4 (0.46) CA2GSK3BALDH1A1TDP1
SCHEMBL3675112 0.81 DAO (0.41) ALDH1A1HTT
SCHEMBL94148 0.81 MAOA (0.48) PTPN1
Ammonia Solution, Strong SCHEMBL27962960 0.79 MAOA (0.47) PTPN1
Ethylene SCHEMBL28271283 0.78 MAOA (0.46) PTPN1
SCHEMBL18973135 0.77 MAPT (0.40) ALDH1A1
SCHEMBL18973131 0.77 HAO1 (0.38) CA2ALDH1A1HTT
SCHEMBL3677950 0.77 MEN1 (0.51) GSK3BIDH1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119403843-A Polymer and method for producing same, photosensitive resin composition, cured product, and monomer compound and method for producing same 株式会社日本触媒 2025-02-07 CN disclosed
CN-114341215-B Curable composition 株式会社日本触媒 2024-12-27 CN disclosed
WO-2024203692-A1 RESIST POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, AND POLYMER PRODUCTION METHOD. 株式会社日本触媒 2024-10-03 WO disclosed
CN-118742581-A Polymer and photosensitive resin composition thereof 株式会社日本触媒 2024-10-01 CN disclosed
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023162889-A1 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION THEREOF 株式会社日本触媒 2023-08-31 WO disclosed
CN-115210271-B N-substituted maleimide polymer and process for producing the same 株式会社日本触媒 2023-08-25 CN disclosed
CN-110531582-B Curable resin composition and use thereof 株式会社日本触媒 2023-05-02 CN disclosed
CN-116057088-A Copolymer, copolymer solution, photosensitive resin composition, cured product, method for producing copolymer, and method for producing copolymer solution 株式会社日本触媒 2023-05-02 CN disclosed
CN-115210271-A N-substituted maleimide polymer and process for producing the same 株式会社日本触媒 2022-10-18 CN disclosed
CN-114341215-A Curable composition 株式会社日本触媒 2022-04-12 CN disclosed
CN-111542554-B Polymer, curable resin composition, and use thereof 株式会社日本触媒 2022-03-18 CN disclosed
CN-113759660-A Coloring composition and coating film forming composition containing the same 山阳色素株式会社 2021-12-07 CN disclosed
WO-2021039799-A1 CURABLE COMPOSITION 株式会社日本触媒 2021-03-04 WO disclosed
CN-105278247-B Curable resin composition and use thereof 株式会社日本触媒 2020-08-18 CN disclosed
CN-111542554-A Polymer, curable resin composition, and use thereof 株式会社日本触媒 2020-08-14 CN disclosed
US-7371783-B2 Alkali-soluble maleimide copolymer and liquid crystal display comprising the same NIPPON SHOKUBAI CO., LTD. (JP) 2008-05-13 US disclosed
US-20050074563-A1 Alkali-soluble maleimide copolymer and liquid crystal display comprising the same DAINIPPON PRINTING CO., LTD. (JP) 2005-04-07 US disclosed
WO-2003027156-A1 ALKALI-SOLUBLE MALEIMIDE COPOLYMER AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME DAINIPPON PRINTING CO., LTD. (JP) 2003-04-03 WO disclosed