SCHEMBL48083

SCHEMBL48083

O=c1oc(-c2ccccc2)c(-c2ccccc2)o1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.44
LMNA P02545 3/20 0.44
MEN1 O00255 3/20 0.44
CYP3A4 P08684 3/20 0.44
ALOX15 P16050 3/20 0.44
KMT2A Q03164 3/20 0.44
TP53 P04637 2/20 0.44
MAPK1 P28482 2/20 0.44
DDR2 Q16832 1/20 0.44
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
ABCB1 P08183 1/20 0.44
CALM1 P0DP23 1/20 0.44
AR P10275 1/20 0.44
PKM P14618 1/20 0.44
CYP1B1 Q16678 1/20 0.44
CA9 Q16790 1/20 0.44
ADORA3 P0DMS8 1/20 0.44
MAPT P10636 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10179796 0.84 CTRC (0.38) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL305332 0.84 KDM4E (0.38) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL981801 0.84 ABCG2 (0.40) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL2468591 0.79 ABCG2 (0.40) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL22356152 0.79 KDM4E (0.44) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL2719464 0.79 TDO2 (0.42) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL2721048 0.79 KDM4E (0.35) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL7128881 0.79 PTGS1 (0.43) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL5492196 0.79 ADORA3 (0.39) KDM4ELMNAMEN1CYP3A4ALOX15
SCHEMBL306962 0.76 KDM4E (0.33) KDM4ELMNAMEN1CYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 725 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119786549-A Negative electrode active material, preparation method thereof, negative electrode plate, battery and electric equipment 比亚迪股份有限公司 2025-04-08 CN claimed
CN-110724160-B Organic silicon flame-retardant additive and flame-retardant lithium ion battery electrolyte 成都硅宝科技股份有限公司 2022-10-14 CN claimed
CN-110724160-A Organic silicon flame-retardant additive and flame-retardant lithium ion battery electrolyte 成都硅宝科技股份有限公司 2020-01-24 CN claimed
EP-1304759-B1 NONAQUEOUS ELECTROLYTE SECONDARY CELL PANASONIC CORP (JP) 2010-09-01 EP claimed
US-20070072086-A1 Nonaqueous electrolyte cell YUASA CORPORATION (JP) 2007-03-29 US claimed
US-20060257743-A1 Nonaqueous electrolyte cell YUASA CORPORATION (JP) 2006-11-16 US claimed
US-6958198-B2 Non-aqueous electrochemical apparatus MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-10-25 US claimed
US-6797745-B1 Hot melt inks containing styrene or terpene polymers XEROX CORPORATION 2004-09-28 US claimed
US-6664008-B1 Comprising solute, cyclic carbonate solvent, and separator; lithium batteries MITSUBISHI CHEMICAL CORPORATION (JP) 2003-12-16 US claimed
US-6461417-B1 Ink compositions XEROX CORPORATION 2002-10-08 US claimed
US-20020039677-A1 Where the difference ( gamma l-gamma se) between the surface tension gamma yl of electrolyte and the surface free energy gamma se of electrode is not more than 10 dynes/cm. MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2002-04-04 US claimed
CN-1333580-A Non-aqueous electrochemistry device MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2002-01-30 CN claimed
EP-1174940-A1 Non-aqueous electrochemical apparatus MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2002-01-23 EP claimed
US-20010038949-A1 Stability; electrolyte mixture containing surfactant MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2001-11-08 US claimed
EP-1146586-A2 Non-aqueous electrolyte secondary battery MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2001-10-17 EP claimed
US-6117223-A Hot melt inks containing polyketones XEROX CORPORATION (US) 2000-09-12 US claimed
US-5770345-A Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-06-23 US claimed
US-5753412-A Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-05-19 US claimed
US-5593812-A Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-01-14 US claimed
EP-0727713-A1 Photoresist having increased sensitivity and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-08-21 EP claimed