SCHEMBL4809569

SCHEMBL4809569

C=COC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.42

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.42
ALDH1A1 P00352 2/20 0.38
HSD11B1 P28845 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
DPP4 P27487 1/20 0.30
DPP8 Q6V1X1 1/20 0.30
DPP9 Q86TI2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL769274 0.86 NPSR1 (0.31) ALDH1A1
SCHEMBL4807428 0.82
SCHEMBL4808508 0.82
SCHEMBL5917752 0.81 PKM (0.42) PKMALDH1A1HSD11B1NPC1RAB9A
SCHEMBL25738316 0.81 PKM (0.42) PKMALDH1A1HSD11B1NPC1RAB9A
Vinyl Ether SCHEMBL769273 0.78 PKM (0.47) PKMALDH1A1HSD11B1NPC1RAB9A
SCHEMBL5195240 0.77 PKM (0.42) PKM
SCHEMBL4805893 0.77 TSHR (0.34)
SCHEMBL4804837 0.77
SCHEMBL414172 0.77 NPSR1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230174471-A1 ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME INHA INDUSTRY PARTNERSHIP INSTITUTE (KR) 2023-06-08 US disclosed
EP-3486067-B1 METHOD FOR PRODUCING ANTIFOULING FILM SHARP KK (JP) 2022-09-28 EP disclosed
CN-109790391-B Curable resin composition for forming easily peelable film and method for producing same 大阪有机化学工业株式会社 2022-04-12 CN disclosed
CN-109475901-B Method for producing antifouling film 夏普株式会社 2021-12-14 CN disclosed
US-11142617-B2 Method for producing antifouling film SHARP KABUSHIKI KAISHA (JP) 2021-10-12 US disclosed
US-11142653-B2 Method for producing antifouling film SHARP KABUSHIKI KAISHA (JP) 2021-10-12 US disclosed
CN-108473623-B Process for producing vinyl ether polymer having hydroxyl group in side chain and temperature-responsive polymer mixture 丸善石油化学株式会社 2020-12-08 CN disclosed
CN-106459295-B Monomer composition and curable composition containing same 株式会社大赛璐 2020-12-08 CN disclosed
EP-3162822-B1 MONOMER COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME DAICEL CORP (JP) 2020-08-26 EP disclosed
CN-109564797-B Film touch sensor and structure including the same 东友精细化工有限公司 2020-06-26 CN disclosed
US-7271297-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-09-18 US disclosed
EP-1826196-A2 Vinyl ether compounds Daicel Chemical Industries, Ltd. (JP) 2007-08-29 EP disclosed
US-20060205957-A1 Process for producing vinyl ether compounds ISHII YASUTAKA 2006-09-14 US disclosed
US-7074970-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-07-11 US disclosed
US-20060058480-A1 Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-03-16 US disclosed
US-20050282985-A1 FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2005-12-22 US disclosed
US-20050004391-A1 Adamantyl vinyl ether compound and production process for the same IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2005-01-06 US disclosed
EP-1486480-A1 Adamantyl vinyl ether compound and production process for the same Idemitsu Petrochemical Co., Ltd. (JP) 2004-12-15 EP disclosed
US-20030083529-A1 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-05-01 US disclosed
EP-1288186-A2 Vinyl ether compounds and preparation process thereof Daicel Chemical Industries, Ltd. (JP) 2003-03-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050004391-A1 Adamantyl vinyl ether compound and production process for the same NOTUM, CYP4A11, CYP4F11 PKM 3119/4885ALDH1A1 414/4885HSD11B1 74/4885
US-20230174471-A1 ACETAL-BASED COMPOUND, ACETAL-BASED PREPOLYMER, ACETAL-BASED POLYMER, AND PHOTORESIST COMPOSITION COMPRISING THE SAME PARP10, ADCY10, APRT PKM 479/4885ALDH1A1 83/4885HSD11B1 2112/4885
US-20060205957-A1 Process for producing vinyl ether compounds ETV6, CYP3A4, SUV39H2 PKM 1297/4885ALDH1A1 1064/4885HSD11B1 91/4885
US-20050282985-A1 FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION AFF1, AFF2, FPR1 PKM 4371/4885ALDH1A1 512/4885HSD11B1 3278/4885
US-20030083529-A1 Process for producing vinyl ether compounds SRD5A2, RPS4X, RUVBL2 PKM 1756/4885ALDH1A1 673/4885HSD11B1 90/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.