SCHEMBL4817475

SCHEMBL4817475

O=C(O)/C(=C/C=C/c1ccccc1)c1ccccc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C1 Q04828 2/20 0.60
LMNA P02545 7/20 0.50
MAPT P10636 4/20 0.50
MAOB P27338 2/20 0.50
PLIN1 O60240 2/20 0.50
RECQL P46063 2/20 0.50
PLIN5 Q00G26 2/20 0.50
ABHD5 Q8WTS1 2/20 0.50
BCHE P06276 1/20 0.50
TNFRSF1A P19438 1/20 0.50
ACHE P22303 1/20 0.50
CYP1B1 Q16678 1/20 0.50
GRIK1 P39086 1/20 0.47
MCL1 Q07820 1/20 0.47
PLA2G7 Q13093 1/20 0.47
ALDH1A1 P00352 6/20 0.47
MAPK1 P28482 2/20 0.47
TRPA1 O75762 1/20 0.47
ALOX5 P09917 1/20 0.47
HDAC3 O15379 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1901012 1.00 AKR1C1 (0.60) AKR1C1LMNAMAPTMAOBPLIN1
SCHEMBL11290831 0.87 TTR (0.50) AKR1C1LMNAMAPTMAOBPLIN1
SCHEMBL11290828 0.87 TTR (0.50) AKR1C1LMNAMAPTMAOBPLIN1
SCHEMBL11290833 0.87 TTR (0.50) AKR1C1LMNAMAPTMAOBPLIN1
SCHEMBL3218657 0.85 LMNA (0.47) AKR1C1LMNAMAPTMAOBPLIN1
SCHEMBL27746174 0.84 CYP1A1 (0.52) AKR1C1MAOBCYP1B1TRPA1HDAC3
SCHEMBL28205425 0.82 LCK (0.44) AKR1C1LMNAMAPTMAOBPLIN1
SCHEMBL14311430 0.82 AKR1C1 (0.45) AKR1C1MAOBGRIK1MCL1ALDH1A1
SCHEMBL5081017 0.81 ALDH1A1 (0.71) LMNAMAPTMAOBBCHECYP1B1
SCHEMBL4364435 0.78 AKR1C1 (0.52) AKR1C1MAPTRECQLALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7405028-B2 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography INFINEON TECHNOLOGIES, AG (DE) 2008-07-29 US disclosed
US-20050170283-A1 Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography POLARIS INNOVATIONS LIMITED (IE) 2005-08-04 US disclosed
WO-1999029640-A2 COMPOSITIONS AND METHODS FOR MODULATING THE ACTIVITY OF FIBROBLAST GROWTH FACTOR EISAI CO., LTD. (JP) 1999-06-17 WO disclosed