Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 7/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | TYR | P14679 | 1/20 | 0.41 |
| ▸ | UQCRB | P14927 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.39 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | GMNN | O75496 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL5068667 | 0.92 | ALDH1A1 (0.47) | ALDH1A1ACHEHSD11B1LMNATYR | |
| Sulfuric Acid SCHEMBL5068665 | 0.92 | ALDH1A1 (0.52) | ALDH1A1ACHEHSD11B1LMNATYR | |
| SCHEMBL3211989 | 0.91 | ALDH1A1 (0.44) | ALDH1A1ACHEHSD11B1LMNATYR | |
| SCHEMBL1718945 | 0.90 | ALDH1A1 (0.47) | ALDH1A1HSD11B1LMNATYRUQCRB | |
| Sulfuric Acid SCHEMBL482026 | 0.90 | ALDH1A1 (0.50) | ALDH1A1ACHEHSD11B1LMNATYR | |
| SCHEMBL1718940 | 0.90 | ALDH1A1 (0.50) | ALDH1A1ACHEHSD11B1LMNATYR | |
| SCHEMBL4483664 | 0.86 | ALDH1A1 (0.47) | ALDH1A1ACHEHSD11B1LMNACA1 | |
| SCHEMBL8131241 | 0.86 | ALDH1A1 (0.52) | ALDH1A1ACHEHSD11B1LMNAUQCRB | |
| SCHEMBL8131239 | 0.86 | ALDH1A1 (0.44) | ALDH1A1ACHEHSD11B1LMNAUQCRB | |
| Trifluoromethanesulfonic Acid SCHEMBL36627 | 0.85 | ALDH1A1 (0.46) | ALDH1A1ACHEHSD11B1LMNAUQCRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2256551-B1 | Pattern forming process using a chemically amplified resist composition | SHINETSU CHEMICAL CO (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8288076-B2 | Chemically amplified resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| EP-2112554-B1 | Sulfonium salt-containing polymer, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-8114570-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | disclosed |
| US-6416928-B1 | HALOGENONIUM OR SULFONIUM SALTS OF SULFONATED DIPHENYLALKANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| EP-0250893-B1 | COLOUR FILTER ELEMENTS | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1992-08-19 | — | — | EP | disclosed |
| EP-0250893-A1 | Colour filter elements | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1988-01-07 | — | — | EP | disclosed |
| EP-0244704-A2 | Photoelectrographic elements and imaging method | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-11-11 | — | — | EP | disclosed |
| US-4661429-A | CONDUCTIVE LAYER IN ELECTRICAL CONTACT WITH ACID PHOTOGENERATING LAYER | EASTMAN KODAK COMPANY (US) | 1987-04-28 | — | — | US | disclosed |
| US-4650734-A | ACID PHOTOGENERATOR | EASTMAN KODAK COMPANY (US) | 1987-03-17 | — | — | US | disclosed |
| US-3981897-A | Method for making certain halonium salt photoinitiators | GENERAL ELECTRIC COMPANY (US) | 1976-09-21 | — | — | US | disclosed |