Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD1 known ✓ | P21728 | 1/20 | 0.40 |
| ▸ | DRD3 known ✓ | P35462 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | ACHE | P22303 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL5068665 | 0.94 | ALDH1A1 (0.52) | ALDH1A1ACHECA1CA2CA9 | |
| Sulfuric Acid SCHEMBL482026 | 0.92 | ALDH1A1 (0.50) | ALDH1A1ACHECA1CA2CA9 | |
| Sulfuric Acid SCHEMBL482028 | 0.90 | ALDH1A1 (0.48) | ALDH1A1ACHECA1CA2CA9 | |
| SCHEMBL4483664 | 0.88 | ALDH1A1 (0.47) | ALDH1A1ACHECA1CA2CA9 | |
| SCHEMBL8131241 | 0.88 | ALDH1A1 (0.52) | ALDH1A1ACHECA1CA2CA9 | |
| SCHEMBL1718945 | 0.88 | ALDH1A1 (0.47) | ALDH1A1CA1CA2CA9HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL36627 | 0.86 | ALDH1A1 (0.46) | ALDH1A1ACHECA1CA2CA9 | |
| SCHEMBL218163 | 0.86 | ALDH1A1 (0.46) | ALDH1A1ACHECA1CA2CA9 | |
| Sulfuric Acid SCHEMBL5068667 | 0.85 | ALDH1A1 (0.47) | ALDH1A1ACHECA1CA2CA9 | |
| SCHEMBL217706 | 0.85 | ALDH1A1 (0.48) | ALDH1A1ACHECA1CA2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20250256980-A1 | METAL OXIDE PARTICLE HAVING CORE-SHELL STRUCTURE AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| US-12359039-B2 | Metal oxide particle-containing composition with reduced occurrence of volatile aldehydes | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-15 | — | — | US | disclosed |
| WO-2025127152-A1 | METAL OXIDE PARTICLES HAVING IMPROVED HYDROPHOBICITY, HIGHLY CONCENTRATED METAL OXIDE SOL, AND METHODS FOR PRODUCING SAME | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| WO-2025084429-A1 | SILICA PARTICLES FOR COATING COMPOSITION AND LAMINATED SUBSTRATE | 日産化学株式会社 | 2025-04-24 | — | — | WO | disclosed |
| EP-4541769-A1 | METAL OXIDE PARTICLE HAVING CORE-SHELL STRUCTURE AND METHOD FOR PRODUCING SAME | Nissan Chemical Corporation (JP) | 2025-04-23 | — | — | EP | disclosed |
| WO-2025069657-A1 | METAL OXIDE PARTICLES WITH COATING AND VARNISH USING SAME | 日産化学株式会社 | 2025-04-03 | — | — | WO | disclosed |
| US-20250109302-A1 | CONDUCTIVE STANNIC OXIDE PARTICLE-CONTAINING ORGANIC SOLVENT-DISPERSED SOL AND METHOD OF PRODUCTION THEREOF | NISSAN CHEMICAL CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| WO-2025057876-A1 | METAL OXIDE SOL CONTAINING POLYMERIZABLE SILANE COMPOUND AND METHOD FOR PRODUCING SAME | 日産化学株式会社 | 2025-03-20 | — | — | WO | disclosed |
| EP-1167349-B1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-6818379-B2 | SULFONIUM SALT REPRESENTED BY THE FOLLOWING FORMULA (I): WHEREIN Q1, Q2 AND Q3 EACH INDEPENDENTLY REPRESENT HYDROGEN, HYDROXY, ALKYL HAVING 1 TO 6 CARBON ATOMS, OR ALKOXY HAVING 1 TO 6 CARBON ATOMS, BUT ALL OF Q1, Q2 AND Q3 ARE NOT THE SAME; | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-16 | — | — | US | disclosed |
| US-20040224251-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040138353-A1 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-07-15 | — | — | US | disclosed |
| US-20030148211-A1 | Sulfonium salt and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-6509125-B1 | Colored layers containing a dye-bonded polymer | TOPPAN PRINTING CO., LTD. (JP) | 2003-01-21 | — | — | US | disclosed |
| US-20020196896-A1 | Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-12-26 | — | — | US | disclosed |
| EP-1193553-A2 | Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | CD63, SLC39A3, ZRANB2 | DRD1 2044/4885DRD3 1394/4885ALDH1A1 3551/4885 |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | SCO2, SOD1, SPOP | DRD1 1599/4885DRD3 1854/4885ALDH1A1 3162/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.