Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL36627

CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
ACHE P22303 3/20 0.41
HSD11B1 P28845 8/20 0.39
RORA P35398 1/20 0.39
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
LMNA P02545 2/20 0.38
GAA P10253 1/20 0.38
HSD17B3 P37058 1/20 0.37
UQCRB P14927 1/20 0.37
HSD17B2 P37059 1/20 0.37
GPR3 P46089 1/20 0.37
MAPT P10636 2/20 0.37
HPGD P15428 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
NPC1 O15118 1/20 0.37
GMNN O75496 1/20 0.37
DRD1 P21728 1/20 0.37
DRD3 P35462 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL1270048 0.93 HSD11B1 (0.41) ALDH1A1ACHEHSD11B1CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL1002309 0.93 HSD11B1 (0.41) ALDH1A1ACHEHSD11B1CA1CA2
Biphenyl SCHEMBL1360704 0.89 PTPN1 (0.43) ALDH1A1ACHEHSD11B1HSD17B3UQCRB
Sulfuric Acid SCHEMBL5068665 0.88 ALDH1A1 (0.52) ALDH1A1ACHEHSD11B1CA1CA2
Tert-Butylbenzene SCHEMBL2964334 0.88 GPR3 (0.41) ALDH1A1ACHEHSD11B1CA1CA2
SCHEMBL3174077 0.88 ALDH1A1 (0.42) ALDH1A1ACHEHSD11B1RORACA1
SCHEMBL2438900 0.88 ALDH1A1 (0.42) ALDH1A1ACHEHSD11B1RORACA1
Sulfuric Acid SCHEMBL482026 0.86 ALDH1A1 (0.50) ALDH1A1ACHEHSD11B1CA1CA2
SCHEMBL1718940 0.86 ALDH1A1 (0.50) ALDH1A1ACHEHSD11B1CA1CA2
SCHEMBL3762393 0.86 TSHR (0.44) ALDH1A1ACHEHSD11B1RORACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3996 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
US-20250177927-A1 SUPPORTED MEMBRANES BY THERMAL AND UV INITITATED MASS POLYMERIZATION PROMERUS, LLC (US) 2025-06-05 US claimed
EP-4563614-A1 CURABLE COMPOSITION COMPRISING A MULTIFUNCTIONAL HALOGENATED THIOXANTHONE AND ITS USES ARKEMA FRANCE (FR) 2025-06-04 EP claimed
CN-120005123-A Acrylic ester block copolymer resin, photoresist, and preparation method and application thereof 中国石油化工股份有限公司 2025-05-16 CN claimed
US-20250122402-A1 LONG SHELF-LIFE STABLE MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING PYRIDINE LIGATED PALLADIUM COMPOUNDS PROMERUS, LLC (US) 2025-04-17 US claimed
CN-119431101-A Preparation method of bis (4-tert-butylphenyl) iodonium trifluoromethane sulfonate 沾化大荣化工科技有限公司 2025-02-14 CN claimed
US-20250021002-A1 BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) 2025-01-16 US claimed
CN-111045296-B UV patternable polymer blend for organic thin film transistor 康宁股份有限公司 2024-12-27 CN claimed
CN-118393810-A Additive for prolonging shelf life of Arf photoresist, photoresist composition and preparation method of photoresist composition 上海艾深斯科技有限公司 2024-07-26 CN claimed
EP-0594257-B1 2-Saccharinylmethyl aryl carboxylates useful as proteolytic enzyme inhibitors and compositions and method of use thereof STERLING WINTHROP INC (US) 1996-07-10 EP claimed
US-5512417-A Positive resist composition comprising a bis (t-butoxycarbonylmethly(thymolphthalein as a dissolution inhibitor SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-04-30 US claimed
EP-0679951-A1 Positive resist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1995-11-02 EP claimed
US-5356753-A A polyhydroxystyrene resin having some hydroxyl groups substituted by tert-butoxycarbonyloxy groups; solution blocking agent; an onium salt SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-10-18 US claimed
US-5256510-A Usable with laser diodes EASTMAN KODAK COMPANY (US) 1993-10-26 US claimed
EP-0557501-A1 OPTICAL RECORDING WITH NEAR-INFRARED DYES TO EFFECT BLEACHING EASTMAN KODAK COMPANY (US) 1993-09-01 EP claimed
US-5221591-A Photoelectrographic imaging with a multi-active element containing near-infrared sensitizing pigments EASTMAN KODAK COMPANY (US) 1993-06-22 US claimed
EP-0542523-A1 Positive resist material SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-05-19 EP claimed
WO-1993006597-A1 OPTICAL RECORDING WITH NEAR-INFRARED DYES TO EFFECT BLEACHING EASTMAN KODAK COMPANY (US) 1993-04-01 WO claimed
WO-1992022856-A1 PHOTOELECTROGRAPHIC IMAGING WITH A MULTI-ACTIVE ELEMENT CONTAINING NEAR-INFRARED SENSITIZING PIGMENTS EASTMAN KODAK COMPANY (US) 1992-12-23 WO claimed