Known targets — ChEMBL curated mechanism
FGFR1FGFR2FGFR3FGFR4FLT1FLT4KDRPDGFRAPDGFRB
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | ACHE | P22303 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.39 |
| ▸ | CA1 | P00915 | 4/20 | 0.39 |
| ▸ | CA2 | P00918 | 4/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | BCHE | P06276 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | GMNN | O75496 | 1/20 | 0.38 |
| ▸ | DRD1 | P21728 | 1/20 | 0.38 |
| ▸ | DRD3 | P35462 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL218163 | 0.91 | ALDH1A1 (0.46) | ALDH1A1ACHEPOLBHSD11B1CA1 | |
| Sulfuric Acid SCHEMBL5068665 | 0.90 | ALDH1A1 (0.52) | ALDH1A1ACHEHSD11B1CA1CA2 | |
| SCHEMBL7584853 | 0.90 | ALDH1A1 (0.42) | ALDH1A1ACHEPOLBHSD11B1CA1 | |
| Sulfuric Acid SCHEMBL482026 | 0.88 | ALDH1A1 (0.50) | ALDH1A1ACHEHSD11B1CA1CA2 | |
| SCHEMBL1718940 | 0.88 | ALDH1A1 (0.50) | ALDH1A1ACHEHSD11B1CA1CA2 | |
| SCHEMBL4899932 | 0.87 | ALDH1A1 (0.40) | ALDH1A1ACHEPOLBHSD11B1CA1 | |
| Sulfuric Acid SCHEMBL482028 | 0.86 | ALDH1A1 (0.48) | ALDH1A1ACHEHSD11B1CA1CA2 | |
| SCHEMBL8131241 | 0.85 | ALDH1A1 (0.52) | ALDH1A1ACHEHSD11B1CA1CA2 | |
| SCHEMBL449582 | 0.84 | HDAC3 (0.40) | ALDH1A1ACHEPOLBHSD11B1MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL36627 | 0.83 | ALDH1A1 (0.46) | ALDH1A1ACHEHSD11B1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7576223-B2 | Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20080269506-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2008-10-30 | — | — | US | disclosed |
| US-7396899-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL CO., LTD. (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20070123674-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2007-05-31 | — | — | US | disclosed |
| US-7160669-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-01-09 | — | — | US | disclosed |
| EP-1167349-B1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-6818379-B2 | SULFONIUM SALT REPRESENTED BY THE FOLLOWING FORMULA (I): WHEREIN Q1, Q2 AND Q3 EACH INDEPENDENTLY REPRESENT HYDROGEN, HYDROXY, ALKYL HAVING 1 TO 6 CARBON ATOMS, OR ALKOXY HAVING 1 TO 6 CARBON ATOMS, BUT ALL OF Q1, Q2 AND Q3 ARE NOT THE SAME; | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-16 | — | — | US | disclosed |
| US-20040224251-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040138353-A1 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-07-15 | — | — | US | disclosed |
| US-20030148211-A1 | Sulfonium salt and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-20020196896-A1 | Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-12-26 | — | — | US | disclosed |
| EP-1193553-A2 | Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080269506-A1 | Chemical amplification type resist composition | ASIC1, POLR2B, POLR2A | ALDH1A1 1431/4885ACHE 3453/4885POLB 6/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.