SCHEMBL4822497

SCHEMBL4822497

C=C(C(N)=O)C(C)N(C(C)C)C(C)C

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3282753 0.80 LMNA (0.31)
SCHEMBL27347 0.78 TDP1 (0.39) TDP1
Sulfuric Acid SCHEMBL22730071 0.76 TDP1 (0.33) TDP1
Chloromethane SCHEMBL3886405 0.74 TDP1 (0.36) TDP1
SCHEMBL4827681 0.74 TDP1 (0.32) TDP1
SCHEMBL1432176 0.74 LMNA (0.32)
SCHEMBL443670 0.73 PGR (0.40) TDP1
SCHEMBL7187887 0.71 TDP1 (0.47) TDP1
SCHEMBL15071 0.71
SCHEMBL1000863 0.70 CHRNB2 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7407706-B2 Encapsulated matter comprising multiple polymeric coatings of opposite charges and production process thereof SEIKO EPSON CORPORATION (JP) 2008-08-05 US disclosed
US-20060222851-A1 Encapsulated matter and production process thereof SEIKO EPSON CORPORATION 2006-10-05 US disclosed