Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 1/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.35 |
| ▸ | KIF11 | P52732 | 1/20 | 0.34 |
| ▸ | ACACB | O00763 | 1/20 | 0.32 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23506913 | 0.86 | — | — | |
| SCHEMBL23369311 | 0.82 | NPC1 (0.34) | MAPT | |
| SCHEMBL23366545 | 0.82 | RAB9A (0.45) | KIF11KDM4EMAPT | |
| SCHEMBL245948 | 0.81 | SLC6A2 (0.37) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL26746 | 0.80 | SLC6A2 (0.44) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| Hydrochloric Acid SCHEMBL8317302 | 0.79 | SLC6A2 (0.36) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| Hydrochloric Acid SCHEMBL8632732 | 0.79 | SLC6A2 (0.36) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL5543641 | 0.77 | MAPT (0.42) | KIF11MEN1KMT2AKDM4ECYP3A4 | |
| SCHEMBL8321721 | 0.75 | KIF11 (0.38) | KIF11RIPK1MEN1KMT2AKDM4E | |
| SCHEMBL246587 | 0.74 | KIF11 (0.40) | SLC6A2SLC6A4SLC6A3KIF11ACACB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0665220-B1 | Novel sulfonium salt and chemically amplified positive resist composition | SHINETSU CHEMICAL CO (JP) | 1999-04-07 | — | — | EP | claimed |
| EP-0665220-A1 | Novel sulfonium salt and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-02 | — | — | EP | claimed |
| JP-7215930-A | — | — | None | — | — | JP | disclosed |
| JP-7324069-A | — | — | None | — | — | JP | disclosed |
| EP-2218715-B1 | PHOTOACID GENERATOR AND PHOTOREACTIVE COMPOSITION | SUMITOMO SEIKA CHEMICALS (JP) | 2017-06-28 | — | — | EP | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| CN-101925594-B | Photoacid generators and photoreactive compositions | SUMITOMO SEIKA CHEMICALS | 2013-11-20 | — | — | CN | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8216768-B2 | Photoacid generator and photoreactive composition | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2012-07-10 | — | — | US | disclosed |
| EP-1117003-B1 | Process of preparing a chemical amplification type resist composition | SHINETSU CHEMICAL CO (JP) | 2012-06-20 | — | — | EP | disclosed |
| US-5633409-A | POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5633409-A | POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5624787-A | NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-29 | — | — | US | disclosed |
| US-5569784-A | FINE PATTERN; PREVENTS POST-EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-10-29 | — | — | US | disclosed |
| JP-H07324069-A | NOVEL SULFONIUM SALT AND CHEMICALLY AMPLIFICATIVE POSITIVE RESIST MATERIAL | SHIN ETSU CHEM CO LTD | 1995-12-12 | — | — | JP | disclosed |
| EP-0667338-A1 | Sulfonium salt and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-16 | — | — | EP | disclosed |
| JP-H07215930-A | BIS(P-T-BUTOXYPHENYL) SULFOXIDE | SHIN ETSU CHEM CO LTD | 1995-08-15 | — | — | JP | disclosed |
| EP-0665220-A1 | Novel sulfonium salt and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-02 | — | — | EP | disclosed |
| EP-0665220-A1 | Novel sulfonium salt and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-02 | — | — | EP | disclosed |