SCHEMBL4828994

SCHEMBL4828994

C=C(C=S)C(=O)Oc1ccc(Cl)cc1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP11B1 P15538 3/20 0.41
CYP11B2 P19099 2/20 0.41
ELANE P08246 2/20 0.39
LIPE Q05469 4/20 0.38
KMT2A Q03164 4/20 0.37
CYP1A2 P05177 2/20 0.37
CYP2D6 P10635 2/20 0.37
CYP2C19 P33261 2/20 0.37
CYP2C9 P11712 1/20 0.37
HPGD P15428 1/20 0.37
MEN1 O00255 3/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MAPT P10636 2/20 0.36
CYP3A4 P08684 1/20 0.36
PPARA Q07869 1/20 0.36
HTT P42858 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36
BCHE P06276 1/20 0.36
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL544811 0.81 ELANE (0.45) ELANEKMT2AHPGDMEN1MAPT
SCHEMBL1412681 0.79 FABP7 (0.44) ELANEKMT2ACYP1A2CYP2C19CYP2C9
SCHEMBL5320836 0.79 ELANE (0.44) CYP11B1CYP11B2ELANELIPEKMT2A
SCHEMBL1412687 0.78 MAPT (0.47) KMT2ACYP1A2CYP2D6MEN1SMN1; SMN2
SCHEMBL7063178 0.78 ELANE (0.50) CYP11B1CYP11B2ELANELIPEKMT2A
SCHEMBL1412800 0.77 CA1 (0.51) KMT2AMEN1MAPTALDH1A1
SCHEMBL9575359 0.76 ELANE (0.42) CYP11B1CYP11B2ELANELIPEKMT2A
SCHEMBL452065 0.76 ELANE (0.59) CYP11B1CYP11B2ELANELIPEKMT2A
SCHEMBL1412698 0.73 CA12 (0.49) KMT2ACYP1A2CYP2D6CYP2C19HPGD
SCHEMBL8663497 0.72 MEN1 (0.47) CYP11B1CYP11B2ELANELIPEKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed