SCHEMBL4828996

SCHEMBL4828996

C=C(CS)C(=O)Oc1ccc(Cl)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.39
TAAR1 Q96RJ0 1/20 0.39
LIPE Q05469 2/20 0.38
CYP11B1 P15538 1/20 0.37
CYP11B2 P19099 1/20 0.37
KMT2A Q03164 4/20 0.37
CYP1A2 P05177 2/20 0.37
CYP2D6 P10635 2/20 0.37
CYP2C19 P33261 2/20 0.37
CYP2C9 P11712 1/20 0.37
HPGD P15428 1/20 0.37
MEN1 O00255 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PPARA Q07869 2/20 0.36
MAPT P10636 2/20 0.36
CYP3A4 P08684 1/20 0.36
NR4A2 P43354 1/20 0.36
PPARG P37231 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7079700 0.82 KMT2A (0.43) ELANETAAR1LIPECYP11B1CYP11B2
SCHEMBL544812 0.81 ELANE (0.45) ELANEHPGDMAPT
SCHEMBL9355225 0.81 KMT2A (0.46) ELANETAAR1LIPECYP11B1CYP11B2
SCHEMBL5320836 0.79 ELANE (0.44) ELANETAAR1LIPECYP11B1CYP11B2
SCHEMBL7063178 0.78 ELANE (0.50) ELANETAAR1LIPECYP11B1CYP11B2
SCHEMBL8483877 0.77 KMT2A (0.47) ELANETAAR1LIPECYP11B1CYP11B2
SCHEMBL9575359 0.76 ELANE (0.42) ELANETAAR1LIPECYP11B1CYP11B2
SCHEMBL452065 0.76 ELANE (0.59) ELANELIPECYP11B1CYP11B2KMT2A
SCHEMBL7690584 0.73 LTA4H (0.47) TAAR1KMT2AMEN1PPARAMAPT
SCHEMBL11344904 0.73 KMT2A (0.49) ELANEKMT2AMEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed