SCHEMBL482969

SCHEMBL482969

CCCCC(CC)Cc1ccccc1C(=O)Nc1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(NC(=O)c3ccccc3CC(CC)CCCC)c2F)c1F

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
CA2 P00918 1/20 0.33
CYP3A4 P08684 1/20 0.33
TP53 P04637 2/20 0.33
PTPN1 P18031 1/20 0.33
L3MBTL1 Q9Y468 2/20 0.32
EPHX2 P34913 1/20 0.32
LMNA P02545 2/20 0.32
CNR2 P34972 1/20 0.31
GLA P06280 1/20 0.31
TSHR P16473 1/20 0.31
HTT P42858 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
RXFP1 Q9HBX9 1/20 0.30
FLT1 P17948 1/20 0.30
KDR P35968 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482975 0.86 TP53 (0.34) ALDH1A1TP53L3MBTL1LMNAHTT
SCHEMBL23854487 0.84
SCHEMBL267592 0.82 PTPN1 (0.36) TP53PTPN1L3MBTL1LMNACNR2
SCHEMBL266307 0.82 PTPN1 (0.36) TP53PTPN1L3MBTL1LMNACNR2
SCHEMBL483000 0.81 ALDH1A1 (0.36) ALDH1A1CA2L3MBTL1LMNATSHR
SCHEMBL483355 0.80 ALDH1A1 (0.39) ALDH1A1TP53LMNAHTTNPC1
SCHEMBL483287 0.80 L3MBTL1 (0.35) ALDH1A1PTPN1L3MBTL1LMNAHTT
SCHEMBL483289 0.79 RECQL (0.39) ALDH1A1CYP3A4TP53L3MBTL1LMNA
SCHEMBL5198749 0.79 SLC16A3 (0.37) CYP3A4PTPN1EPHX2MEN1KMT2A
SCHEMBL482616 0.78 CNR1 (0.36) ALDH1A1EPHX2LMNACNR2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210197447-A1 Method for Making an Object PHOTOCENTRIC LIMITED (GB) 2021-07-01 US disclosed
EP-3492982-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2020-11-11 EP disclosed
EP-3492982-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2019-06-05 EP disclosed
EP-3295246-B1 METHOD FOR MAKING AN OBJECT PHOTOCENTRIC LTD (GB) 2019-05-01 EP disclosed
US-20180141268-A1 Method for Making an Object PHOTOCENTRIC LIMITED (GB) 2018-05-24 US disclosed
EP-1471387-B1 Photosensitive composition and compound used thereof FUJIFILM CORP (JP) 2015-11-11 EP disclosed
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
US-8114569-B2 Maskless photopolymer exposure process and apparatus PHOTOCENTRIC LIMITED (GB) 2012-02-14 US disclosed
EP-1288720-B1 Plate-making method of printing plate FUJIFILM CORP (JP) 2012-02-01 EP disclosed
EP-1744212-B1 Photosensitive composition FUJIFILM CORP (JP) 2012-01-11 EP disclosed
US-20030207204-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. 2003-11-06 US disclosed
US-20030190554-A1 Photopolymerization; development using alkalinity developer FUJIFILM CORPORATION (JP) 2003-10-09 US disclosed
EP-1341040-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 2003-09-03 EP disclosed
US-20030084806-A1 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJIFILM CORPORATION (JP) 2003-05-08 US disclosed
EP-1288720-A1 Plate-making method of printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-03-05 EP disclosed
EP-1238801-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed
EP-0860741-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 2001-05-16 EP disclosed
US-6051367-A COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH FUJI PHOTO FILM CO., LTD. (JP) 2000-04-18 US disclosed
EP-0860741-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1998-08-26 EP disclosed
US-5026625-A Photoinitiators for polymerization of ethylenically unsaturated compounds CIBA-GEIGY CORPORATION (US) 1991-06-25 US disclosed