SCHEMBL483287

SCHEMBL483287

COCCc1ccccc1C(=O)Nc1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(NC(=O)c3ccccc3CCOC)c2F)c1F

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.35
HPGD P15428 2/20 0.34
KDM4E B2RXH2 2/20 0.34
SLC16A3 O15427 1/20 0.34
RAB9A P51151 5/20 0.33
NPC1 O15118 4/20 0.33
SMN1; SMN2 Q16637 3/20 0.33
LMNA P02545 3/20 0.33
GAA P10253 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
FLT1 P17948 2/20 0.33
KDR P35968 2/20 0.33
ALDH1A1 P00352 2/20 0.33
POLB P06746 1/20 0.32
HTT P42858 1/20 0.32
MAPT P10636 1/20 0.32
PTPN1 P18031 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL267592 0.89 PTPN1 (0.36) L3MBTL1SLC16A3RAB9ANPC1LMNA
SCHEMBL266307 0.89 PTPN1 (0.36) L3MBTL1SLC16A3RAB9ANPC1LMNA
SCHEMBL483355 0.87 ALDH1A1 (0.39) KDM4ESLC16A3RAB9ANPC1SMN1; SMN2
SCHEMBL483000 0.86 ALDH1A1 (0.36) L3MBTL1HPGDKDM4ESLC16A3RAB9A
SCHEMBL482975 0.86 TP53 (0.34) L3MBTL1HPGDRAB9ANPC1SMN1; SMN2
SCHEMBL267282 0.83 ALDH1A1 (0.30) SLC16A3ALDH1A1
SCHEMBL23854482 0.82 L3MBTL1 (0.34) L3MBTL1
SCHEMBL268803 0.82 HPGD (0.44) HPGDKDM4ESLC16A3RAB9ANPC1
SCHEMBL483289 0.82 RECQL (0.39) L3MBTL1HPGDRAB9ANPC1SMN1; SMN2
SCHEMBL5691541 0.81 TP53 (0.33) L3MBTL1HPGDKDM4ERAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3492982-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2020-11-11 EP disclosed
EP-3492982-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2019-06-05 EP disclosed
EP-1471387-B1 Photosensitive composition and compound used thereof FUJIFILM CORP (JP) 2015-11-11 EP disclosed
EP-0949540-B1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJIFILM CORP (JP) 2012-05-02 EP disclosed
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
EP-1288720-B1 Plate-making method of printing plate FUJIFILM CORP (JP) 2012-02-01 EP disclosed
EP-1744212-B1 Photosensitive composition FUJIFILM CORP (JP) 2012-01-11 EP disclosed
EP-1834765-A2 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
US-7267925-B2 Photosensitive composition and novel compound used therefor FUJIFILM CORPORATION (JP) 2007-09-11 US disclosed
EP-1249731-A2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-16 EP disclosed
EP-1238801-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed
EP-0860741-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 2001-05-16 EP disclosed
EP-1091247-A2 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 2001-04-11 EP disclosed
US-6153660-A VERY HIGH SENSITIVITY TO BEAMS IN THE VISIBLE REGION, PARTICULARLY TO VISIBLE RAYS AT 400 NM OR MORE SUCH AS RAYS AT 488 NM OR 532 NM CORRESPONDING TO THE OUTPUT OF AR+ LASER OR YAG-SHG LASER FUJI PHOTO FILM CO., LTD. (JP) 2000-11-28 US disclosed
US-6051367-A COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH FUJI PHOTO FILM CO., LTD. (JP) 2000-04-18 US disclosed
EP-0949540-A1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-13 EP disclosed
EP-0924570-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1999-06-23 EP disclosed
EP-0860741-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1998-08-26 EP disclosed
US-5026625-A Photoinitiators for polymerization of ethylenically unsaturated compounds CIBA-GEIGY CORPORATION (US) 1991-06-25 US disclosed