SCHEMBL4830574

SCHEMBL4830574

C=C(CS)C(=O)Oc1cccc2ccccc12

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.51
HSD17B10 Q99714 3/20 0.51
GAA P10253 2/20 0.51
PGR P06401 1/20 0.51
PTGS1 P23219 1/20 0.51
MAPK1 P28482 1/20 0.51
KMT2A Q03164 3/20 0.50
MEN1 O00255 1/20 0.50
RAB9A P51151 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
KDM4E B2RXH2 3/20 0.49
HPGD P15428 2/20 0.49
TDP1 Q9NUW8 1/20 0.49
MMP2 P08253 1/20 0.44
OGG1 O15527 1/20 0.44
FABP7 O15540 3/20 0.43
FABP3 P05413 3/20 0.43
FABP5 Q01469 3/20 0.43
BCHE P06276 1/20 0.43
SLC6A3 Q01959 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5402020 0.85 ALDH1A1 (0.53) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL1336289 0.84 ALDH1A1 (0.55) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL25823479 0.83 ALDH1A1 (0.54) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL7181428 0.82 ALDH1A1 (0.65) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL7761152 0.81 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL10752270 0.80 WDR5 (0.40) ALDH1A1KMT2ARAB9AKDM4EHPGD
SCHEMBL10752170 0.80 NCEH1 (0.45) ALDH1A1HSD17B10RAB9ATSHRMAPT
SCHEMBL10750357 0.80 HPGD (0.41) RAB9AL3MBTL1HPGDMAPT
SCHEMBL18832076 0.79 ALDH1A1 (0.47) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL10401169 0.78 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed