SCHEMBL4831741

SCHEMBL4831741

COc1cc(OC)c(S(=O)(=O)OC2C3C(=O)C4C(=O)N(OS(=O)(=O)c5c(OC)cc(OC)cc5OC)C(=O)C4C3C[N+]2=O)c(OC)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4835070 0.83 — —
SCHEMBL4835078 0.82 GAA (0.35) —
SCHEMBL4834428 0.81 — —
SCHEMBL4834039 0.76 VDR (0.40) —
SCHEMBL4829775 0.76 MEN1 (0.41) —
SCHEMBL4834979 0.76 PARL (0.42) —
SCHEMBL4835040 0.75 — —
SCHEMBL4834939 0.75 ALDH1A1 (0.43) —
SCHEMBL4834366 0.75 MEN1 (0.38) —
SCHEMBL4835746 0.74 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed
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