SCHEMBL4835746

SCHEMBL4835746

CS(=O)(=O)OC1C2C(=O)C3C(=O)N(OS(C)(=O)=O)C(=O)C3C2C[N+]1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4835049 0.83 — —
SCHEMBL4827154 0.82 — —
SCHEMBL4834592 0.81 — —
SCHEMBL4834428 0.78 — —
SCHEMBL4834861 0.75 KMT2A (0.32) —
SCHEMBL4827150 0.75 KDM4E (0.36) —
SCHEMBL4836681 0.75 — —
SCHEMBL4834939 0.74 ALDH1A1 (0.43) —
SCHEMBL4834868 0.74 PTGS2 (0.36) —
SCHEMBL4831893 0.71 PKM (0.32) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed
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