SCHEMBL4832043

SCHEMBL4832043

CC(C)S(=O)(=O)ON1C(=O)C2CC3C(=O)N(OS(=O)(=O)C(C)C)C(=O)C3CC2C1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4829729 0.82 — —
SCHEMBL4834426 0.78 — —
SCHEMBL4834694 0.74 — —
SCHEMBL63449 0.74 PARL (0.46) —
SCHEMBL5370076 0.69 MGLL (0.33) —
SCHEMBL4837258 0.67 VDR (0.58) —
SCHEMBL4837362 0.67 — —
SCHEMBL4834476 0.67 CA12 (0.34) —
SCHEMBL4835081 0.66 MAPT (0.39) —
SCHEMBL4837033 0.66 PARL (0.64) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed
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