SCHEMBL4834748

SCHEMBL4834748

O=C1C2CC3C(=O)N(OS(=O)(=O)C(F)(F)F)C(=O)C3CC2C(=O)N1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16883333 0.85 ALDH1A1 (0.34)
SCHEMBL12333680 0.84 ALDH1A1 (0.39)
SCHEMBL19055991 0.83 DRD2 (0.31)
SCHEMBL4831836 0.82
SCHEMBL16883336 0.80 DRD2 (0.32)
SCHEMBL4834763 0.80 CA2 (0.42)
SCHEMBL14564324 0.79 ALDH1A1 (0.46)
SCHEMBL14448181 0.79 ALDH1A1 (0.46)
SCHEMBL14491491 0.79 ALDH1A1 (0.46)
SCHEMBL107102 0.79 ALDH1A1 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed