SCHEMBL4827150

SCHEMBL4827150

O=C1C2C(=O)N(OS(=O)(=O)c3ccc(Br)cc3)C(=O)C2C2C[N+](=O)C(OS(=O)(=O)c3ccc(Br)cc3)C12

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.36
▸ LMNA P02545 1/20 0.36
▸ MAPT P10636 1/20 0.36
▸ THRB P10828 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ PARL Q9H300 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4834366 0.91 MEN1 (0.38) PARL
SCHEMBL4831861 0.90 ALDH1A1 (0.36) KDM4EALDH1A1HPGDPARL
SCHEMBL4834039 0.90 VDR (0.40) KDM4EALDH1A1LMNAMAPTHPGD
SCHEMBL4831912 0.90 PARL (0.30) PARL
SCHEMBL4834979 0.89 PARL (0.42) KDM4EALDH1A1MAPTHPGDPARL
SCHEMBL4831802 0.88 KDM4E (0.43) KDM4EALDH1A1MAPT
SCHEMBL4834868 0.88 PTGS2 (0.36) —
SCHEMBL4835078 0.88 GAA (0.35) KDM4EALDH1A1
SCHEMBL4837187 0.87 MMP2 (0.33) ALDH1A1LMNAPARL
SCHEMBL4835373 0.87 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 — — US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 — — US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 KDM4E 2501/4885ALDH1A1 633/4885LMNA 1522/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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