SCHEMBL4836339

SCHEMBL4836339

COC(C(=O)OC([SiH3])(O[Si](C)(C)C)C(O[Si](C)(C)C)C(C)C)=C(OC)c1ccccc1OC.COc1ccc(C=CC(=O)OC(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 1/20 0.35
LMNA P02545 2/20 0.34
TDP1 Q9NUW8 1/20 0.34
MAPT P10636 4/20 0.33
KDM4E B2RXH2 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
CA12 O43570 1/20 0.33
AKR1B10 O60218 1/20 0.33
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
AKR1B1 P15121 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
CA14 Q9ULX7 1/20 0.33
GLA P06280 1/20 0.33
HTT P42858 1/20 0.33
RECQL P46063 1/20 0.33
MMP1 P03956 1/20 0.33
CASP3 P42574 2/20 0.33
SENP7 Q9BQF6 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28460174 0.86 HPGD (0.34) SMN1; SMN2MEN1RAB9AKMT2AALDH1A1
SCHEMBL4836334 0.79 ABCG2 (0.37) ABCG2LMNATDP1MAPTKDM4E
SCHEMBL3246993 0.71 HPGD (0.36) ABCG2MAPTSMN1; SMN2MEN1RAB9A
SCHEMBL6701256 0.71 KDM4E (0.45) ABCG2LMNAKDM4ESMN1; SMN2CA1
SCHEMBL30664617 0.67 HPGD (0.47) MAPTSMN1; SMN2RAB9AKMT2AALDH1A1
SCHEMBL342878 0.66 CA12 (0.71) LMNATDP1MAPTKDM4ESMN1; SMN2
SCHEMBL15838 0.66 CA12 (0.71) LMNATDP1MAPTKDM4ESMN1; SMN2
SCHEMBL28693380 0.66 ABCG2 (0.46) ABCG2LMNASMN1; SMN2MEN1RAB9A
Water SCHEMBL8001684 0.65 CA12 (0.69) LMNATDP1MAPTKDM4ESMN1; SMN2
Acetic Acid SCHEMBL28512748 0.63 CA12 (0.65) LMNATDP1MAPTKDM4ESMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008032883-A2 COMPOSITION FOR THE PREPARATION OF COSMETICS, COSMETIC, AND METHOD FOR THE PREPARATION OF WATER-CONTAINING COSMETICS DOW CORNING TORAY CO., LTD. (JP) 2008-03-20 WO disclosed