SCHEMBL4837459

SCHEMBL4837459

O=C1C2CC3C(=O)N(OS(=O)(=O)c4ccccc4C(F)(F)F)C(=O)C3CC2C(=O)N1OS(=O)(=O)c1ccccc1C(F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.50
MEN1 O00255 1/20 0.50
LIPE Q05469 1/20 0.39
SLC22A12 Q96S37 7/20 0.39
CYP2C9 P11712 1/20 0.39
SLC22A6 Q4U2R8 1/20 0.39
SLC22A8 Q8TCC7 1/20 0.39
SLC22A11 Q9NSA0 1/20 0.39
ALDH1A1 P00352 1/20 0.36
PARL Q9H300 1/20 0.36
LMNA P02545 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
CTSS P25774 1/20 0.35
F2 P00734 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4831923 0.87 KMT2A (0.50) KMT2AMEN1LIPESLC22A12CYP2C9
SCHEMBL547625 0.84 KMT2A (0.46) KMT2AMEN1LIPESLC22A12ALDH1A1
SCHEMBL29369448 0.84 KMT2A (0.46) KMT2AMEN1LIPESLC22A12ALDH1A1
SCHEMBL4361781 0.83 KMT2A (0.45) KMT2AMEN1LIPESLC22A12CYP2C9
SCHEMBL4334243 0.81 KMT2A (0.43) KMT2AMEN1LIPESLC22A12CYP2C9
SCHEMBL452741 0.81 PARL (0.57) KMT2AMEN1SLC22A12CYP2C9SLC22A6
SCHEMBL29369615 0.81 PARL (0.57) KMT2AMEN1SLC22A12CYP2C9SLC22A6
SCHEMBL2069720 0.79 KMT2A (0.43) KMT2AMEN1LIPESLC22A12CYP2C9
SCHEMBL29369870 0.79 KMT2A (0.43) KMT2AMEN1LIPESLC22A12CYP2C9
SCHEMBL29369802 0.78 KDM4E (0.55) KMT2AMEN1SLC22A12CYP2C9SLC22A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 KMT2A 1016/4885MEN1 211/4885LIPE 3281/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.