SCHEMBL4840786

SCHEMBL4840786

Cc1ccc(C(=O)c2ccc(C(=O)O)cc2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ SRD5A2 P31213 11/20 1.00
▸ ALDH1A1 P00352 2/20 0.85
▸ SMN1; SMN2 Q16637 1/20 0.85
▸ LMNA P02545 1/20 0.80
▸ AKR1C3 P42330 1/20 0.61
▸ TP53 P04637 1/20 0.60
▸ TSHR P16473 1/20 0.60
▸ CES2 O00748 2/20 0.56
▸ CES1 P23141 2/20 0.56
▸ RXRA P19793 1/20 0.54
▸ RXRB P28702 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
4-Methylbenzoic Acid SCHEMBL147465 0.92 ALDH1A1 (1.00) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
Terephthalic Acid SCHEMBL526449 0.92 ALDH1A1 (1.00) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL93638 0.92 ALDH1A1 (1.00) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL1331178 0.92 ALDH1A1 (1.00) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL11366477 0.92 ALDH1A1 (1.00) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
Terephthalic Acid SCHEMBL15994097 0.92 ALDH1A1 (1.00) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL9663158 0.90 ALDH1A1 (0.94) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL6916675 0.90 ALDH1A1 (0.94) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL6915086 0.90 ALDH1A1 (0.94) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3
4-Methylbenzoic Acid SCHEMBL8165638 0.90 ALDH1A1 (0.94) SRD5A2ALDH1A1SMN1; SMN2LMNAAKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102236209-B Producing method of liquid crystal display element, polymer composition and liquid crystal display element JSR CORP 2015-02-25 — — CN disclosed
CN-103937510-A Liquid crystal alignment agent for PSA (Polymer Sustained Alignment) liquid crystal display component and application thereof JSR CORP 2014-07-23 — — CN disclosed
CN-102629030-A Liquid crystal display element and manufacturing method thereof, and liquid crystal orientation agent JSR CORP 2012-08-08 — — CN disclosed
CN-102236209-A Producing method of liquid crystal display element, polymer composition and liquid crystal display element JSR CORP 2011-11-09 — — CN disclosed
US-7316892-B2 Process of preparing planographic printing plate KONICA MINOLTA MEDICAL & GRAPHIC INC. (JP) 2008-01-08 — — US disclosed
US-7220530-B2 Light sensitive planographic printing plate material KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-05-22 — — US disclosed
US-7147991-B2 Process of preparing planographic printing plate KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2006-12-12 — — US disclosed
US-20050214685-A1 Process of preparing planographic printing plate Minolta, Konica 2005-09-29 — — US disclosed
US-20050196700-A1 Process of preparing planographic printing plate KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2005-09-08 — — US disclosed
EP-1571492-A1 Process of preparing planographic printing plate Konica Minolta Medical & Graphic, Inc. (JP) 2005-09-07 — — EP disclosed
EP-0728482-A2 Use of hcp specific compounds to enhance erythropoiesis SMITHKLINE BEECHAM CORPORATION (US) 1996-08-28 — — EP disclosed
EP-0727211-A1 Use of src SH2 specific compounds to treat a bone resorption disease SMITHKLINE BEECHAM CORPORATION (US) 1996-08-21 — — EP disclosed
WO-1996024343-A1 USE OF LCK SH2 SPECIFIC COMPOUNDS TO TREAT AUTOIMMUNE DISEASES AND ALLOGRAFT REJECTION SMITHKLINE BEECHAM CORPORATION (US) 1996-08-15 — — WO disclosed
US-5427887-A Blend of a diazo resin and an alkali soluble and swellable polymer KONICA CORPORATION (JP) 1995-06-27 — — US disclosed
EP-0397375-B1 Photosensitive composition and photosensitive lithographic printing plate KONISHIROKU PHOTO IND (JP) 1994-04-06 — — EP disclosed
EP-0583962-A2 Light-sensitive composition KONICA CORPORATION (JP) 1994-02-23 — — EP disclosed
US-5260161-A Developability after storage for long time, press life, and ink attachibility KONICA CORPORATION (JP) 1993-11-09 — — US disclosed
US-4498963-A Photopolymerizable composition containing perester photoinitiator and photopolymerization process BOWLING GREEN STATE UNIVERSITY (US) 1985-02-12 — — US disclosed
US-4416826-A PHOTOINITIATORS FOR POLYMERIZATION OF ETHYLENICALLY UNSATURATED MATERIALS BOWLING GREEN STATE UNIVERSITY, AN EDUCATIONAL INSTITUTION OF OH. 1983-11-22 — — US disclosed
US-4173708-A Purification of 4,4'-benzophenonedicarboxylic acid ALLIED CHEMICAL CORPORATION (US) 1979-11-06 — — US disclosed
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