SCHEMBL4847229

SCHEMBL4847229

O=C(O)c1cc(C(F)(F)F)cc(C(F)(F)F)c1C(F)(F)F

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.47
RXRA P19793 4/20 0.46
RXRB P28702 4/20 0.46
ALDH1A1 P00352 3/20 0.44
HPGD P15428 3/20 0.44
RXRG P48443 3/20 0.44
KDM4E B2RXH2 2/20 0.44
HSD17B10 Q99714 2/20 0.44
ASPH Q12797 1/20 0.43
TAS2R14 Q9NYV8 2/20 0.40
GPR17 Q13304 1/20 0.39
USP2 O75604 1/20 0.39
CYP2C19 P33261 1/20 0.39
GPR35 Q9HC97 1/20 0.38
LIPC P11150 1/20 0.38
LIPG Q9Y5X9 1/20 0.38
AKR1C3 P42330 1/20 0.37
AKR1C2 P52895 1/20 0.37
NOTUM Q6P988 1/20 0.37
MEN1 O00255 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8037311 0.81 CES2 (0.47) CES2RXRARXRBALDH1A1HPGD
SCHEMBL25574138 0.81 CES2 (0.47) CES2RXRARXRBALDH1A1HPGD
SCHEMBL5102453 0.79 RXRA (0.49) CES2RXRARXRBALDH1A1HPGD
SCHEMBL7928555 0.79 CES2 (0.46) CES2RXRARXRBALDH1A1HPGD
SCHEMBL8462310 0.77 CES2 (0.43) CES2RXRARXRBALDH1A1HPGD
SCHEMBL8461706 0.77 CES2 (0.43) CES2RXRARXRBALDH1A1HPGD
SCHEMBL6756054 0.76 CES2 (0.41) CES2RXRARXRBALDH1A1HPGD
SCHEMBL424263 0.76 CES2 (0.78) CES2RXRARXRBALDH1A1HPGD
SCHEMBL3369693 0.75 CES2 (0.48) CES2RXRARXRBALDH1A1HPGD
SCHEMBL6789331 0.75 ALDH1A1 (0.50) CES2RXRARXRBALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11953829-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-04-09 US disclosed
US-20200192220-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-06-18 US disclosed
US-20200192220-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-06-18 US disclosed
US-7371866-B2 Preparation of aromatic and heteroaromatic carboxylic acids by catalytic ozonolysis DSM FINE CHEMICALS AUSTRIA NFG GMBH & CO KG (AT) 2008-05-13 US disclosed
US-20030216577-A1 Preparation of aromatic and heteroaromatic carboxylic acids by catalytic ozonolysis DSM FINE CHEMICALS AUSTRIA NFG GMBH & COKG (AT) 2003-11-20 US disclosed