Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.48 |
| ▸ | RXRA | P19793 | 4/20 | 0.46 |
| ▸ | RXRB | P28702 | 4/20 | 0.46 |
| ▸ | RXRG | P48443 | 3/20 | 0.46 |
| ▸ | GPR17 | Q13304 | 1/20 | 0.43 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.41 |
| ▸ | ASPH | Q12797 | 1/20 | 0.40 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.39 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | P2RX1 | P51575 | 1/20 | 0.38 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8037311 | 0.88 | CES2 (0.47) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL30532294 | 0.88 | CES2 (0.43) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL423246 | 0.88 | CES2 (0.43) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL420887 | 0.88 | RXRA (0.46) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL22043721 | 0.88 | CES2 (0.43) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL29560279 | 0.86 | ALDH1A1 (0.51) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL22866749 | 0.86 | ALDH1A1 (0.51) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL423115 | 0.86 | GABRP (0.44) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL424607 | 0.83 | POLQ (0.40) | CES2RXRARXRBRXRGGPR17 | |
| SCHEMBL22114832 | 0.82 | ASPH (0.40) | CES2RXRARXRBRXRGALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160016860-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | DUBLIN CITY UNIVERSITY (IE) | 2016-01-21 | — | — | US | claimed |
| EP-2970347-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | Dublin City University (IE) | 2016-01-20 | — | — | EP | claimed |
| WO-2014140353-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | DUBLIN CITY UNIVERSITY (IE) | 2014-09-18 | — | — | WO | claimed |
| CN-119486565-A | Perovskite precursor solution, perovskite solar cell, preparation method and photovoltaic module | 天合光能股份有限公司 | 2025-02-18 | — | — | CN | disclosed |
| US-11953829-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-04-09 | — | — | US | disclosed |
| US-11573491-B2 | Negative tone photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-02-07 | — | — | US | disclosed |
| WO-2022263533-A1 | METHOD FOR PREPARATION OF A P-TYPE SEMICONDUCTING LAYER, P-TYPE SEMICONDUCTING LAYER, ORGANIC ELECTRONIC DEVICE, DISPLAY DEVICE, METAL COMPOUND AND USE OF SAID METAL COMPOUND | NOVALED GMBH (DE) | 2022-12-22 | — | — | WO | disclosed |
| EP-4106024-A1 | METHOD FOR PREPARATION OF A P-TYPE SEMICONDUCTING LAYER, P-TYPE SEMICONDUCTING LAYER OBTAINED BY SAID METHOD, ORGANIC ELECTRONIC DEVICE COMPRISING THE P-TYPE SEMICONDUCTING LAYER, DISPLAY DEVICE COMPRISING THE ORGANIC ELECTRONIC DEVICE, METAL COMPOUND AND USE OF SAID METAL COMPOUND FOR THE P-TYPE SEMICONDUCTING LAYER | Novaled GmbH (DE) | 2022-12-21 | — | — | EP | disclosed |
| EP-3779596-A1 | NEGATIVE-TYPE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM Corporation (JP) | 2021-02-17 | — | — | EP | disclosed |
| US-20210011380-A1 | NEGATIVE TONE PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-01-14 | — | — | US | disclosed |
| US-20200192220-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20080161520-A1 | Heterocycle-bearing onium salts | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-07-03 | — | — | US | disclosed |
| US-7371866-B2 | Preparation of aromatic and heteroaromatic carboxylic acids by catalytic ozonolysis | DSM FINE CHEMICALS AUSTRIA NFG GMBH & CO KG (AT) | 2008-05-13 | — | — | US | disclosed |
| US-7318991-B2 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-15 | — | — | US | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| US-20060167324-A1 | High-purity (fluoroalkyl)benzene derivative and process for producing the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-07-27 | — | — | US | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| EP-1500641-A1 | HIGH-PURITY (FLUOROALKYL)BENZENE DERIVATIVE AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2005-01-26 | — | — | EP | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-20030216577-A1 | Preparation of aromatic and heteroaromatic carboxylic acids by catalytic ozonolysis | DSM FINE CHEMICALS AUSTRIA NFG GMBH & COKG (AT) | 2003-11-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160016860-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | DCXR, TECR, PWWP2B | CES2 2281/4885RXRA 2889/4885RXRB 3099/4885 |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | NOX4, CBR1, CBR3 | CES2 463/4885RXRA 192/4885RXRB 212/4885 |
| US-20060167324-A1 | High-purity (fluoroalkyl)benzene derivative and process for producing the same | HBB, AFF4, AFF2 | CES2 2075/4885RXRA 1226/4885RXRB 553/4885 |
| US-20080161520-A1 | Heterocycle-bearing onium salts | MCM5, NIT2, PCNA | CES2 2439/4885RXRA 3883/4885RXRB 4166/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.